Dr. Rainer Zimmermann
at Synopsys GmbH
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Printing, Semiconducting wafers, 3D modeling, Calibration, Optimization (mathematics), Source mask optimization, Manufacturing

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Image quality, Photomasks, Scanning electron microscopy, Nanoimprint lithography, Backscatter, Modulation, Acquisition tracking and pointing, Ions, Metals, Line width roughness

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Data modeling, 3D modeling, Electron beam direct write lithography, Point spread functions, Critical dimension metrology, Model-based design, Geometrical optics, Cadmium, Error analysis, Virtual reality

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical proximity correction, Critical dimension metrology, Manufacturing, Lithography, Tolerancing, Photomasks, Design for manufacturability, Product engineering, Semiconductors, Control systems

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Photoresist processing, Image processing, Metrology, Thin films, Image acquisition, Error analysis

Showing 5 of 9 publications
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