Dr. Rajesh Nagpal Profile

Dr. Rajesh Nagpal

Assistant Engineering Manager at Intel Corp

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Author

Publications (7)

Proceedings Article | 30 September 2009 Paper

Aerial image based die-to-model inspections of advanced technology masks

Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan

Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners

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Proceedings Article | 19 May 2008 Paper

Wafer plane inspection for advanced reticle defects

Rajesh Nagpal, Firoz Ghadiali, Jun Kim, Tracy Huang, Song Pang

Proceedings Volume 7028, 70281H (2008) https://doi.org/10.1117/12.793058

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect inspection, Wafer inspection, Defect detection, Lithography, Critical dimension metrology, Contamination

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Proceedings Article | 20 May 2006 Paper

Femtopulse laser-based mask repair in the DUV wavelength regime

Firoz Ghadiali, Vikram Tolani, Rajesh Nagpal, Tod Robinson, Jeff LeClaire, Ron Bozak, David Lee, Roy White

Proceedings Volume 6283, 628329 (2006) https://doi.org/10.1117/12.681779

KEYWORDS: Laser ablation, Deep ultraviolet, Electrons, Photomasks, Femtosecond phenomena, Chromium, Pulsed laser operation, Microscopes, Critical dimension metrology, Absorption

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Proceedings Article | 10 May 2005 Paper

Understanding and reduction of defects on finished EUV masks

Ted Liang, Peter Sanchez, Guojing Zhang, Emily Shu, Rajesh Nagpal, Alan Stivers

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.604717

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Deep ultraviolet, Scanning electron microscopy, Atomic force microscopy, Contamination, Defect inspection, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 December 2004 Paper

EUV mask pilot line at Intel Corporation

Alan Stivers, Pei-Yang Yan, Guojing Zhang, Ted Liang, Emily Shu, Edita Tejnil, Barry Lieberman, Rajesh Nagpal, Kangmin Hsia, Michael Penn, Fu-Chang Lo

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569176

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Extreme ultraviolet lithography, Reflectivity, Metrology, Lithography, Optical lithography, Standards development, Mask making

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Proceedings Article | 6 December 2004 Paper

EUVL mask patterning with blanks from commercial suppliers

Pei-Yang Yan, Guojing Zhang, Rajesh Nagpal, Emily Shu, Chaoyang Li, Ping Qu, Frederick Chen

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569329

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Photomasks, Optical lithography, Ruthenium, Etching, Inspection, Chromium, Coating, Scanning electron microscopy

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Proceedings Article | 28 May 2004 Paper

Lithography-based automation in the design of program defect masks

George Vakanas, Saghir Munir, Edita Tejnil, Daniel Bald, Rajesh Nagpal

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544536

KEYWORDS: Computer aided design, Photomasks, Inspection, Optical proximity correction, SRAF, Binary data, Image processing, Model-based design, Defect inspection, Resolution enhancement technologies

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Showing 5 of 7 publications

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