Dr. Rasit O. Topaloglu Profile

Dr. Rasit O. Topaloglu

at IBM Corp

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Author

Publications (9)

Proceedings Article | 4 April 2017 Presentation + Paper

Identification and sensitivity analysis of a correlated ground rule system (design arc)

Eric Eastman, Dureseti Chidambarrao, Werner Rausch, Rasit Topaloglu, Dongbing Shao, Ravikumar Ramachandran, Matthew Angyal

Proceedings Volume 10148, 101480I (2017) https://doi.org/10.1117/12.2258002

KEYWORDS: Monte Carlo methods, Computer simulations, Tolerancing, 3D modeling, Lithography, Semiconductors, Logic, Performance modeling, Process engineering, Data modeling, Manufacturing, Design for manufacturability, Detection and tracking algorithms, Statistical modeling, Systems modeling

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Proceedings Article | 31 March 2014 Paper

Computational lithography platform for 193i-guided directed self-assembly

Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

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Proceedings Article | 23 March 2012 Paper

Efficient multi-die placement for blank defect mitigation in EUV lithography

Yuelin Du, Hongbo Zhang, Martin D. F. Wong, Yunfei Deng, Rasit Topaloglu

Proceedings Volume 8322, 832231 (2012) https://doi.org/10.1117/12.918075

KEYWORDS: Algorithm development, Dysprosium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Tolerancing, Lithography, Computer simulations, Reticles, Optical alignment

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Proceedings Article | 13 March 2012 Paper

Characterization and decomposition of self-aligned quadruple patterning friendly layout

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu

Proceedings Volume 8326, 83260F (2012) https://doi.org/10.1117/12.918078

KEYWORDS: Optical lithography, Photomasks, 193nm lithography, Electron beam lithography, Algorithm development, Metals, Standards development, Lithography, Manufacturing, Feature extraction

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Proceedings Article | 14 October 2011 Paper

Hot spot detection for indecomposable self-aligned double patterning layout

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu

Proceedings Volume 8166, 81663E (2011) https://doi.org/10.1117/12.896990

KEYWORDS: Photomasks, Silicon, Detection and tracking algorithms, Double patterning technology, Lithography, Manufacturing, Semiconducting wafers, Binary data, Overlay metrology, Standards development

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Proceedings Article | 14 October 2011 Paper

EUV mask preparation considering blank defects mitigation

Yuelin Du, Hongbo Zhang, Martin Wong, Rasit Topaloglu

Proceedings Volume 8166, 816611 (2011) https://doi.org/10.1117/12.896996

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Algorithm development, Bismuth, Lithography, Inspection, Mask making, Electrochemical etching, Very large scale integration

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Proceedings Article | 5 April 2011 Paper

Timing variability analysis for layout-dependent-effects in 28nm custom and standard cell-based designs

Philippe Hurat, Rasit Topaloglu, Ramez Nachman, Piyush Pathak, Jac Condella, Sriram Madhavan, Luigi Capodieci

Proceedings Volume 7974, 797412 (2011) https://doi.org/10.1117/12.882508

KEYWORDS: Transistors, Lithography, Standards development, Neodymium, Silicon, Data modeling, Statistical analysis, Device simulation, Calibration, Ions

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Proceedings Article | 4 April 2011 Paper

Is manufacturability with double patterning a burden on designer? Analyses of device and circuit aspects

Rasit Onur Topaloglu

Proceedings Volume 7974, 79740A (2011) https://doi.org/10.1117/12.882565

KEYWORDS: Double patterning technology, Lithography, Photomasks, Overlay metrology, Manufacturing, Analog electronics, Resistance, Mirrors, Etching, Capacitance

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Proceedings Article | 23 March 2011 Paper

Effective decomposition algorithm for self-aligned double patterning lithography

Hongbo Zhang, Yuelin Du, Martin D. Wong, Rasit Topaloglu, Will Conley

Proceedings Volume 7973, 79730J (2011) https://doi.org/10.1117/12.879324

KEYWORDS: Photomasks, Lithography, Double patterning technology, Silicon, Semiconducting wafers, Etching, Overlay metrology, Logic, Tolerancing, Manufacturing

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Showing 5 of 9 publications

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