Rehab Kotb Ali
Product Engineer at Siemens EDA
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Design for manufacturing, Image enhancement, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 21 March 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Model-based design

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, SRAF

Showing 5 of 11 publications
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