Dr. Ricardo Ruiz Profile

Dr. Ricardo Ruiz

Staff Scientist at Lawrence Berkeley National Lab

SPIE Involvement:

Conference Co-Chair | Conference Program Committee | Editor | Author | Instructor

Proceedings Article | 10 April 2024 Presentation

Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks

Beihang Yu, Maggy Harake, Yujin Lee, Stacey Bent, Ricardo Ruiz

Proceedings Volume PC12956, PC129560S (2024) https://doi.org/10.1117/12.3011335

KEYWORDS: Photomasks, Metal oxides, Atomic layer deposition, Silicon, Lithography, Semiconductor manufacturing, Reactive ion etching, Polystyrene, Polymers, Optical lithography

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Proceedings Article | 10 April 2024 Presentation

Applying area-selective atomic layer deposition for high-precision pattern transfer

Yujin Lee, Maggy Harake, Beihang Yu, Ricardo Ruiz, Stacey Bent

Proceedings Volume PC12956, PC129560T (2024) https://doi.org/10.1117/12.3012187

KEYWORDS: Atomic layer deposition, Adsorption, X-ray photoelectron spectroscopy, Stochastic processes, Optical lithography, Extreme ultraviolet, Chemical reactions, Chemical analysis, Semiconductors, Polystyrene

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Proceedings Article | 10 April 2024 Presentation

Characterization of chemical/structural information of latent image via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Ricardo Ruiz, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume 12955, 129550A (2024) https://doi.org/10.1117/12.3010967

KEYWORDS: Scattering, X-rays, X-ray imaging, X-ray characterization, Photoresist materials, X-ray sources, Data modeling, Light scattering, Laser scattering, Extreme ultraviolet lithography

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Proceedings Article | 22 November 2023 Poster

Metrology development on latent images via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Ricardo Ruiz, Dinesh Kumar, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume PC12750, PC1275012 (2023) https://doi.org/10.1117/12.2689943

KEYWORDS: Scattering, X-rays, X-ray imaging, Metrology, Systems modeling, X-ray sources, X-ray characterization, Time metrology, Spatial resolution, Simulations

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Proceedings Article | 30 April 2023 Presentation

A holistic approach to high precision patterning science

Ricardo Ruiz, Stacey Bent, Samuel Blau, Brett Helms, Frances Houle, Oleg Kostko, Patrick Naulleau, Paul Nealey, Christopher Ober, Dahyun Oh, Rachel Segalman, Cheng Wang

Proceedings Volume PC12497, PC124970J (2023) https://doi.org/10.1117/12.2662699

KEYWORDS: Optical lithography, Stochastic processes, Photoresist materials, Molecular self-assembly, Materials processing, Extreme ultraviolet lithography, Extreme ultraviolet, X-ray characterization, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 13 June 2022 Presentation

Orientational control of 2D polymer grafted nanocrystal superlattices through directed self-assembly

Boyce Chang, Priscilla Pieters, Whitney Loo, Scott Dhuey, Eric Dailing, Yi Liu, Paul Nealey, A. Paul Alivisatos, Ricardo Ruiz

Proceedings Volume PC12054, PC120540F (2022) https://doi.org/10.1117/12.2614291

KEYWORDS: Directed self assembly, Polymers, Nanocrystals, Superlattices, Polymer thin films, Photomasks, Nanofabrication, Molecules, Molecular self-assembly, Lithography

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Proceedings Article | 13 June 2022 Presentation

Effect of pattern transfer process on roughness of block copolymer patterns from directed self-assembly

Whitney Loo, Boyce Chang, Beihang Yu, Scott Dhuey, Ricardo Ruiz, Paul Nealey

Proceedings Volume PC12054, PC1205403 (2022) https://doi.org/10.1117/12.2614072

KEYWORDS: Directed self assembly, Atomic layer deposition, Silicon, Quantitative analysis, Polymethylmethacrylate, Polymers, Photomicroscopy, Optical lithography, Nanostructures, Nanolithography

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Proceedings Article | 22 February 2021 Presentation

Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains

Lei Wan, Ricardo Ruiz

Proceedings Volume 11610, 116100L (2021) https://doi.org/10.1117/12.2584668

KEYWORDS: Directed self assembly, Thermodynamics, Thin films, Semiconductors, Photomasks, Optical lithography, Critical dimension metrology, Annealing

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SPIE Journal Paper | 4 October 2016 Open Access

Special Section Guest Editorial:Alternative Lithographic Technologies V

Chris Bencher, Ricardo Ruiz

JM3, Vol. 15, Issue 03, 031601, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031601

KEYWORDS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography

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SPIE Journal Paper | 11 September 2015 Open Access

Special Section Guest Editorial: Alternative Lithographic Technologies IV

Douglas Resnick, Ricardo Ruiz, Hans Loeschner

JM3, Vol. 14, Issue 03, 031201, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031201

KEYWORDS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly

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SPIE Journal Paper | 3 October 2014 Open Access

Special Section Guest Editorial: Alternative Lithographic Technologies

Douglas Resnick, Christopher Bencher, Ricardo Ruiz

JM3, Vol. 13, Issue 03, 031301, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031301

KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

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SPIE Journal Paper | 30 September 2013 Open Access

Special Section Guest Editorial: Alternative Lithographic Technologies

William Tong, Douglas Resnick, Ricardo Ruiz

JM3, Vol. 12, Issue 03, 031101, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031101

KEYWORDS: Lithography, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Overlay metrology, Explosives, Metrology, Roads, Molecular self-assembly, Directed self assembly

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SPIE Journal Paper | 7 August 2012

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Thomas Albrecht, Paul Nealey

JM3, Vol. 11, Issue 3, 031405, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031405

KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography

K. Patel, R. Ruiz, J. Lille, L. Wan, E. Dobiz, H. Gao, N. Robertson, T. Albrecht

Proceedings Volume 8323, 83230U (2012) https://doi.org/10.1117/12.916589

KEYWORDS: Lithography, Double patterning technology, Etching, Chromium, Optical lithography, Silicon, Reactive ion etching, Plasma, Beam propagation method, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Paul Nealey, Thomas Albrecht

Proceedings Volume 8323, 832319 (2012) https://doi.org/10.1117/12.916592

KEYWORDS: Reactive ion etching, Nanoimprint lithography, Chromium, Lithography, Electron beam lithography, Oxygen, Silicon, Magnetism, Double patterning technology, Directed self assembly

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Proceedings Article | 14 October 2011 Paper

Imprint lithography template technology for bit patterned media (BPM)

J. Lille, K. Patel, R. Ruiz, T.-W. Wu, H. Gao, Lei Wan, G. Zeltzer, E. Dobisz, T. Albrecht

Proceedings Volume 8166, 816626 (2011) https://doi.org/10.1117/12.898785

KEYWORDS: Beam propagation method, Etching, Magnetism, Lithography, Silicon, Head, Electron beam lithography, Oxides, Sensors, Scanning electron microscopy

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Proceedings Article | 20 March 2008 Paper

Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid

Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Ricardo Ruiz, Charles Black, Jed Pitera, Charles Rettner, Myron Flickner

Proceedings Volume 6921, 692129 (2008) https://doi.org/10.1117/12.772684

KEYWORDS: Photomicroscopy, Scanning electron microscopy, Silicon, Plasma etching, Picosecond phenomena, Coating, Oxides, Chromium, Lithography, Directed self assembly

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Proceedings Article | 13 March 2006 Paper

Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films

C. T. Black, R. Ruiz

Proceedings Volume 6153, 615302 (2006) https://doi.org/10.1117/12.659252

KEYWORDS: Polymethylmethacrylate, Polymers, Lithography, Optical lithography, Picosecond phenomena, Semiconductors, Scanning electron microscopy, Thin films, Chemical elements, Image processing

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Proceedings Article | 6 November 2001 Paper

Injection of light into a planar dielectric waveguide of metallic walls

Raul Garcia-Llamas, Jorge Gaspar-Armenta, Felipe Ramos-Mendieta, R. Lopez, Richard Haglund, Ricardo Ruiz

Proceedings Volume 4439, (2001) https://doi.org/10.1117/12.447626

KEYWORDS: Reflectivity, Waveguides, Silver, Dielectrics, Planar waveguides, Metals, Electromagnetism, Radio propagation, Polarization, Dielectric polarization

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Showing 5 of 19 publications

SPIE Conference Volume | 24 April 2024

Novel Patterning Technologies 2024

SPIE Conference Volume | 22 May 2023

Novel Patterning Technologies 2023

Conference Committee Involvement (27)

Novel Patterning Technologies 2025

23 February 2025 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XIV

23 February 2025 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XIII

26 February 2024 | San Jose, California, United States

Novel Patterning Technologies 2024

26 February 2024 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XII

28 February 2023 | San Jose, California, United States

Novel Patterning Technologies 2023

27 February 2023 | San Jose, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning XI

26 April 2022 | San Jose, California, United States

Novel Patterning Technologies 2022

25 April 2022 | San Jose, California, United States

Novel Patterning Technologies 2021

22 February 2021 | Online Only, California, United States

Advanced Etch Technology and Process Integration for Nanopatterning X

22 February 2021 | Online Only, California, United States

Advanced Etch Technology for Nanopatterning IX

25 February 2020 | San Jose, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

24 February 2020 | San Jose, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019

25 February 2019 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning VIII

25 February 2019 | San Jose, California, United States

Novel Patterning Technologies 2018

26 February 2018 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning VII

26 February 2018 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning VI

27 February 2017 | San Jose, California, United States

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

Alternative Lithographic Technologies VIII

22 February 2016 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning V

22 February 2016 | San Jose, California, United States

Alternative Lithographic Technologies VII

23 February 2015 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning IV

23 February 2015 | San Jose, California, United States

Advanced Etch Technology for Nanopatterning III

24 February 2014 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies VI

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies V

25 February 2013 | San Jose, California, United States

Alternative Lithographic Technologies IV

13 February 2012 | San Jose, California, United States

Showing 5 of 27 Conference Committees

Course Instructor

SC1067: Directed Self Assembly and its Application to Nanoscale Fabrication

This course explains basic principles and applications of directed self assembly (DSA), with particular emphasis on block copolymer directed self assembly. A primary goal of the course is to present in a systematic manner the central issues that govern directed self assembly, and to do so in a way that will enable current and future practicioners of directed self assembly to rapidly identify the potential and limitations of this technique for specific applications. Anyone who wants to answer questions such as, "what structures can I create, how robust are certain processes, or what materials should I employ" will benefit from taking this course.

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