Dr. Ricardo Ruiz
Staff Scientist at Lawrence Berkeley National Lab
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (12)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Semiconductors, Thin films, Optical lithography, Annealing, Photomasks, Directed self assembly, Critical dimension metrology, Thermodynamics

SPIE Journal Paper | 4 October 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography

SPIE Journal Paper | 11 September 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly

SPIE Journal Paper | 3 October 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly

SPIE Journal Paper | 30 September 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Lithography, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Overlay metrology, Explosives, Metrology, Roads, Molecular self-assembly, Directed self assembly

Showing 5 of 12 publications
Conference Committee Involvement (21)
Advanced Etch Technology and Process Integration for Nanopatterning X
27 February 2022 | San Jose, California, United States
Novel Patterning and Alternative Lithography Applications 2022
27 February 2022 | San Jose, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Showing 5 of 21 Conference Committees
Course Instructor
SC1067: Directed Self Assembly and its Application to Nanoscale Fabrication
This course explains basic principles and applications of directed self assembly (DSA), with particular emphasis on block copolymer directed self assembly. A primary goal of the course is to present in a systematic manner the central issues that govern directed self assembly, and to do so in a way that will enable current and future practicioners of directed self assembly to rapidly identify the potential and limitations of this technique for specific applications. Anyone who wants to answer questions such as, "what structures can I create, how robust are certain processes, or what materials should I employ" will benefit from taking this course.
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