Dr. Richard Chen
at Tekscend Photomask Chunghwa Inc.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 October 2006 Paper
Star Hoyeh, Richard Chen, Makoto Kozuma, Joann Kuo, Torey Huang, Frank Chen
Proceedings Volume 6349, 63492U (2006) https://doi.org/10.1117/12.686075
KEYWORDS: Ozone, Scanning probe microscopy, Photomasks, Ions, Hydrogen, Reflectivity, Manufacturing, Particles, Plasma, Photoresist processing

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