Richard Collett
VP, Technology Development
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 31 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Polymers, Silicon, Coating, Fourier transforms, Plasma etching, 193nm lithography, Plasma, Bottom antireflective coatings

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Etching, Polymers, Silicon, Fourier transforms, Scanning electron microscopy, Plasma etching, Semiconducting wafers, Plasma, Bottom antireflective coatings

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: FT-IR spectroscopy, Image processing, Nitrogen, Fourier transforms, Photoresist materials, Double patterning technology, Head-mounted displays, Photoresist processing, Semiconducting wafers, Electronic design automation

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Etching, Polymers, Silicon, Coating, Reflectivity, Fourier transforms, Photoresist materials, Immersion lithography, Semiconducting wafers

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