Dr. Richard D. Eandi Profile

Dr. Richard D. Eandi

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Publications (7)

Proceedings Article | 28 August 2003 Paper

Measurement of hard pellicles for 157-nm lithography using Fourier transform phase-shifting interferometry

Leslie Deck, Chris Van Peski, Richard Eandi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504217

KEYWORDS: Pellicles, Reticles, Lithography, Phase interferometry, Fourier transforms, Photomasks, Optical components, Precision measurement, Wavelength tuning, Manufacturing

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Proceedings Article | 16 August 2002 Paper

Long-term performance of the DUV optical metrology tool for the 90-nm node

Louis Chacon, Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479347

KEYWORDS: Optical metrology, Metrology, Photomasks, Deep ultraviolet, Distortion, Wafer-level optics, Lithography, Argon ion lasers, Modulation, Semiconducting wafers

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Proceedings Article | 16 July 2002 Paper

DUV optical metrology for the 90-nm node, CD linearity, contacts, and corner rounding

Louis Chacon, Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473474

KEYWORDS: Lenses, Photomasks, Deep ultraviolet, Optical metrology, Metrology, Optical proximity correction, Algorithm development, Imaging systems, Modulation transfer functions, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

New algorithm for optical photomask CD metrology for the 100-nm node

Nicholas Doe, Richard Eandi, Patrick St. Cin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458295

KEYWORDS: Critical dimension metrology, Metrology, Photomasks, Imaging systems, Modulation transfer functions, Deep ultraviolet, Optics manufacturing, Optical metrology, Binary data, Calibration

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Proceedings Article | 3 February 2000 Paper

Optical proximity effects in submicron photomask CD metrology

Nicholas Doe, Richard Eandi

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377105

KEYWORDS: Optical transfer functions, Critical dimension metrology, Photomasks, Imaging systems, Calibration, Spatial frequencies, Modulation, Metrology, Data modeling, Modulation transfer functions

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Proceedings Article | 30 December 1999 Paper

Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Khoi Phan, Chris Spence, S. Dakshina-Murthy, Vidya Bala, Alvina Williams, Steve Strener, Richard Eandi, Junling Li, Linard Karklin

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373301

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Scanning electron microscopy, Inspection, Optical proximity correction, Binary data, Photoresist processing, Microscopes, Lithography

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Proceedings Article | 18 December 1998 Paper

Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor, Richard Eandi

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332869

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Scanning electron microscopy, Imaging systems, Diffusion, Critical dimension metrology, Manufacturing, Raster graphics, Systems modeling

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Showing 5 of 7 publications

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