Dr. Richard L. Lozes Profile

Dr. Richard L. Lozes

Principal Consultant at Lozes Technology Consulting

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Publications (2)

Proceedings Article | 27 December 2002 Paper

Raster-shaped beam pattern generation for 70-nm photomask production

Thomas Newman, Ira Finklestein, Huei-Mei Kao, Sriram Krishnaswami, Darryn Long, Richard Lozes, Henry Pearce-Percy, Allan Sagle, Jeffrey Varner, Stacey Winter, Mark Gesley, Frank Abboud

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468198

KEYWORDS: Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Modulation, Electron beam lithography, Optical lithography, Chemically amplified resists, Calibration, Lithography

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Proceedings Article | 1 July 1991 Open Access

Phase-shift mask technology: requirements for e-beam mask lithography

Steven Dunbrack, Andrew Muray, Charles Sauer, Richard Lozes, John Nistler, William Arnold, David Kyser, Anna Maria Minvielle, Moshe Preil, Bhanwar Singh, Michael Templeton

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44444

KEYWORDS: Photomasks, Inspection, Reticles, Integrated circuits, Process control, Metrology, Electron beam lithography, Phase shifts, Overlay metrology, Photomicroscopy

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