Dr. Richard Tu
Senior Applications Engineer
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Clocks, Sensors, Quartz, Glasses, Manufacturing, Photomasks, Manufacturing equipment, Semiconducting wafers, Mask cleaning

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Polarization, Calibration, Scanners, Combustion, Polarimetry, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Reticles, Metrology, Clocks, Sensors, Quartz, Glasses, Ionization, Photomasks, Semiconducting wafers, Mask cleaning

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Polarization, Calibration, Image processing, Scanners, Polarimetry, Scanning electron microscopy, Photomasks, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Reticles, Polarization, Scanners, Polarimetry, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, 193nm lithography, Phase shifts

Showing 5 of 26 publications
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