Dr. Richard Tu Profile

Dr. Richard Tu

Senior Applications Engineer

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Author

Publications (26)

Proceedings Article | 27 May 2010 Paper

Assessing equipment and process related electrostatic risks to reticles with E-Reticle system

Richard Tu, Thomas Sebald

Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII

KEYWORDS: Reticles, Clocks, Sensors, Quartz, Glasses, Manufacturing, Photomasks, Manufacturing equipment, Semiconducting wafers, Mask cleaning

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Proceedings Article | 2 April 2010 Paper

Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: tool-to-tool comparison

Gregory McIntyre, Richard Tu, Christopher Robinson

Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV

KEYWORDS: Metrology, Polarization, Calibration, Scanners, Combustion, Polarimetry, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 11 December 2009 Paper

Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system

Richard Tu, Thomas Sebald

Proc. SPIE. 7520, Lithography Asia 2009

KEYWORDS: Reticles, Metrology, Clocks, Sensors, Quartz, Glasses, Ionization, Photomasks, Semiconducting wafers, Mask cleaning

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Proceedings Article | 24 March 2009 Paper

Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture

Gregory McIntyre, Richard Tu

Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII

KEYWORDS: Reticles, Polarization, Calibration, Image processing, Scanners, Polarimetry, Scanning electron microscopy, Photomasks, Semiconducting wafers, Fiber optic illuminators

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Proceedings Article | 4 December 2008 Paper

Resist-based polarization monitoring for 193nm high-numerical aperture lithography

Richard Tu, Gregory McIntyre

Proc. SPIE. 7140, Lithography Asia 2008

KEYWORDS: Lithography, Reticles, Polarization, Scanners, Polarimetry, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, 193nm lithography, Phase shifts

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Proceedings Article | 12 March 2008 Paper

Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook

Gregory McIntyre, Richard Tu

Proc. SPIE. 6924, Optical Microlithography XXI

KEYWORDS: Reticles, Polarization, Calibration, Scanners, Manufacturing, Polarimetry, Scanning electron microscopy, Photomasks, Sodium, Phase shifts

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Proceedings Article | 20 October 2006 Paper

Adding grayscale layer to chrome photomasks

David Poon, James Dykes, Chinheng Choo, Jimmy T. Tsui, Jun Wang, Glenn Chapman, Yuqiang Tu, Patrick Reynolds, Andrew Zanzal

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Thin films, Reticles, Optical lithography, Calibration, Glasses, Argon ion lasers, Photoresist materials, Photomasks, Binary data, Oxidation

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Proceedings Article | 29 March 2006 Paper

Laser-induced oxidation of metallic thin films as a method for creating grayscale photomasks

Glenn Chapman, Yuqiang Tu, Chinheng Choo, Jun Wang, David Poon, Marian Chang

Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII

KEYWORDS: Thin films, Lithography, Beam splitters, Metals, Argon ion lasers, Photoresist materials, Photomasks, Raster graphics, Radium, Oxidation

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Proceedings Article | 1 March 2006 Paper

Real-time optical characterization of laser oxidation process in bimetallic direct write gray scale photomasks

David Poon, Glenn Chapman, Chinheng Choo, Marian Chang, Jun Wang, Yuqiang Tu

Proc. SPIE. 6106, Photon Processing in Microelectronics and Photonics V

KEYWORDS: Thin films, Photovoltaics, Optical filters, Argon ion lasers, Photodiodes, Diodes, Photomasks, Absorbance, Camera shutters, Oxidation

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Proceedings Article | 1 March 2006 Paper

Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

Jun Wang, Marian Chang, Yuqiang Tu, David Poon, Glenn Chapman, Chinheng Choo, Jun Peng

Proc. SPIE. 6106, Photon Processing in Microelectronics and Photonics V

KEYWORDS: Oxides, Modulation, Glasses, Argon ion lasers, Zinc, Objectives, Photomasks, Raster graphics, Zinc oxide, Oxidation

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Proceedings Article | 4 November 2005 Paper

Expanding grayscale capability of direct-write grayscale photomask by using modified Bi/In compositions

David Poon, Glenn Chapman, Chinheng Choo, Jun Wang, Yuqiang Tu, Michelle La Haye

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Oxides, Transparency, Gaussian beams, Glasses, Argon ion lasers, Photomasks, Absorbance, Bismuth, Absorption, Oxidation

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Proceedings Article | 4 May 2005 Paper

Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Glenn Chapman, David Poon, Chinheng Choo, Yuqiang Tu, James Dykes, Jun Wang, Jun Peng, Willy Lennard, Karen Kavanagh

Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII

KEYWORDS: Lithography, Transparency, Glasses, Silicon, Photoresist materials, Silicon films, Photomasks, Aluminum, Absorbance, Oxidation

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Proceedings Article | 12 April 2005 Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Wang, Jun Peng, Yuqiang Tu

Proc. SPIE. 5713, Photon Processing in Microelectronics and Photonics IV

KEYWORDS: Lithography, Calibration, Glasses, Silicon, Photoresist materials, Silicon films, Photomasks, Raster graphics, Camera shutters, Photoresist developing

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Proceedings Article | 9 December 2004 Paper

Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications

Jun Peng, Glenn Chapman, Yuqiang Tu

Proc. SPIE. 5578, Photonics North 2004: Photonic Applications in Astronomy, Biomedicine, Imaging, Materials Processing, and Education

KEYWORDS: Oxides, Etching, Indium, Silicon, Laser processing, Photomasks, Semiconducting wafers, Anisotropic etching, Tin, Oxidation

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Proceedings Article | 6 December 2004 Paper

Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Yuqiang Tu, Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Peng

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Transparency, Calibration, Silicon, Photoresist materials, Photomasks, Absorbance, Raster graphics, Binary data, Camera shutters, Tin

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Proceedings Article | 15 July 2004 Paper

Creating 3D structures with a direct-write grayscale photomask made from Sn/In bimetallic films

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5339, Photon Processing in Microelectronics and Photonics III

KEYWORDS: Glasses, Indium, Argon ion lasers, Photoresist materials, Photomasks, Absorbance, Raster graphics, Binary data, Tin, Absorption

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Proceedings Article | 14 May 2004 Paper

Inorganic Bi/In thermal resist as a high-etch-ratio patterning layer for CF4/CHF3/O2 plasma etch

Yuqiang Tu, Glenn Chapman, Jun Peng

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Optical lithography, Etching, Indium, Silicon, Photoresist materials, Wet etching, Bismuth, Plasma etching, Anisotropic etching, Plasma

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Proceedings Article | 30 December 2003 Paper

Bi/In thermal resist for both Si anisotropic wet etching and Si/SiO2 plasma etching

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5342, Micromachining and Microfabrication Process Technology IX

KEYWORDS: Etching, Indium, Silicon, Photoresist materials, Wet etching, Bismuth, Plasma etching, Semiconducting wafers, Anisotropic etching, Plasma

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Proceedings Article | 17 December 2003 Paper

Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists

Glenn Chapman, Yuqiang Tu, James Dykes, Masahiko Mio, Jun Peng

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Glasses, Argon ion lasers, Semiconductor lasers, Photoresist materials, Photomasks, Absorbance, Bismuth, Raster graphics, Binary data, Absorption

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Proceedings Article | 17 October 2003 Paper

Single step direct-write photomask made from bimetallic Bi/In thermal resist

Glenn Chapman, Richard Tu

Proc. SPIE. 4977, Photon Processing in Microelectronics and Photonics II

KEYWORDS: Oxides, Quartz, Glasses, Solar cells, Silicon, Argon ion lasers, Photomasks, Absorbance, Bismuth, Absorption

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Proceedings Article | 12 June 2003 Paper

Wavelength invariant Bi/In thermal resist as a Si anisotropic etch masking layer and direct-write photomask material

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5039, Advances in Resist Technology and Processing XX

KEYWORDS: Etching, Quartz, Glasses, Silicon, Argon ion lasers, Photomasks, Bismuth, Thermal modeling, Anisotropic etching, Absorption

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Proceedings Article | 15 January 2003 Paper

Bi/In as patterning and masking layers for alkaline-based Si anisotropic etching

Yuqiang Tu, Glenn Chapman

Proc. SPIE. 4979, Micromachining and Microfabrication Process Technology VIII

KEYWORDS: Optical lithography, Etching, Copper, Silicon, Argon ion lasers, Photoresist materials, Photomasks, Bismuth, Semiconducting wafers, Anisotropic etching

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Proceedings Article | 24 July 2002 Paper

Bi/In bimetallic thermal resists for microfabrication, photomasks, and micromachining applications

Glenn Chapman, Richard Tu, Marinko Sarunic

Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX

KEYWORDS: Etching, Copper, Silicon, Argon ion lasers, Photoresist materials, Photomasks, Bismuth, Plating, Photoresist processing, Absorption

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Proceedings Article | 18 June 2002 Paper

Bimetallic thermal activated films for microfabrication, photomasks, and data storage

Richard Tu, Glenn Chapman, Marinko Sarunic

Proc. SPIE. 4637, Photon Processing in Microelectronics and Photonics

KEYWORDS: Etching, Copper, Nickel, Nd:YAG lasers, Photomasks, Bismuth, Plating, Photoresist processing, Semiconducting wafers, Absorption

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Proceedings Article | 24 August 2001 Paper

BiIn: a sensitive bimetallic thermal resist

Glenn Chapman, Richard Tu, Marinko Sarunic, Jagjot Dhaliwal

Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII

KEYWORDS: Etching, Metals, Glasses, Indium, Argon ion lasers, Photoresist materials, Bismuth, Reactive ion etching, Photoresist processing, Pulsed laser operation

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Proceedings Article | 29 June 2001 Paper

Prototype laser-activated bimetallic thermal resist for microfabrication

Marinko Sarunic, Glenn Chapman, Richard Tu

Proc. SPIE. 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI

KEYWORDS: Photovoltaics, Lithium, Indium, Oxygen, Scanning electron microscopy, Bismuth, Microfabrication, Photoresist processing, Prototyping, Process modeling

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Showing 5 of 26 publications

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