Dr. Rina Sharma Profile

Dr. Rina Sharma

Research Associate at National Physical Lab

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 7 May 1999 Paper

Development and investigation of frequency references for the 1.55-um optical communication band

Yordanka Dancheva, Rina Sharma, Uwe Sterr, Fritz Riehle

Proceedings Volume 3571, (1999) https://doi.org/10.1117/12.347620

KEYWORDS: Absorption, Spectroscopy, Semiconductor lasers, Signal to noise ratio, Diffraction gratings, Protactinium, Optical communications, Laser stabilization, Servomechanisms, Doppler effect

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Proceedings Article | 26 May 1995 Paper

Photolithographic mask aligner based on modified moire technique

Rina Sharma, N. Kataria, V. Ojha, Alok Kanjilal, Ram Narain, Vijay Chitnis, Yoshiyuki Uchida

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209319

KEYWORDS: Optical alignment, Photomasks, Semiconducting wafers, Moire patterns, Ferroelectric materials, Wafer-level optics, Lithography, X-ray lithography, Computing systems, Automatic alignment

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SPIE Journal Paper | 1 June 1994

Computer-controlled in-plane alignment using a modified moiré technique

Rina Sharma, Ram Narain, Alok Kanjilal, Vijay Chitnis

OE, Vol. 33, Issue 06, (June 1994) https://doi.org/10.1117/12.10.1117/12.167151

KEYWORDS: Moire patterns, Computing systems, Ferroelectric materials, Optical alignment, Photomasks, Control systems, Human-machine interfaces, Calibration, X-ray lithography, Automatic alignment

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Proceedings Article | 8 August 1993 Paper

Mask alignment technique using phase-shifted moire signals

Rina Sharma, Gururaj Bhat, Alok Kanjilal, Ram Narain, M. Rashmi, Vijay Chitnis, Yoshiyuki Uchida

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150452

KEYWORDS: Optical alignment, Moire patterns, Semiconducting wafers, Photomasks, Phase shifts, Diffraction gratings, Optical lithography, Computer simulations, Ferroelectric materials, Calibration

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Proceedings Article | 16 December 1992 Paper

An automatic angular positioning of mask with wafer using modified moire technique

Brahm Singh, Dr. Kowsalya, Rina Sharma, Ram Narain, Alok Kanjilal, Ramesh Singh, Vijay Chitnis, Yoshihisa Uchida

Proceedings Volume 1622, (1992) https://doi.org/10.1117/12.637260

KEYWORDS: Moire patterns, Semiconducting wafers, Photomasks, Optical alignment, Signal detection, Transducers, Very large scale integration, Fabrication, Photodetectors, Automatic alignment

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