Dr. Rob P. Meagley Profile

Dr. Rob P. Meagley

CEO/CTO at ONE Nanotechnologies LLC

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 30 March 2007 Paper

Novel developers for positive tone EUV photoresists

Geeta Sharma, Shalini Sharma, Michael Rattner, Robert Meagley, Masato Tanaka, Tsutomu Shimokawa, Hikaru Sugita, Tina Wang, Atsushi Shiota

Proceedings Volume 6519, 65190P (2007) https://doi.org/10.1117/12.712377

KEYWORDS: Standards development, Photoresist developing, Photoresist materials, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Polymers, Scanning electron microscopy, Semiconducting wafers, Solids

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Proceedings Article | 21 March 2007 Paper

Enhancing photoresist performance with an adhesion promoting photo-acid generator

Shalini Sharma, Robert Meagley

Proceedings Volume 6519, 65190K (2007) https://doi.org/10.1117/12.712359

KEYWORDS: Diffusion, Lithography, Deep ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Silver, Interfaces, Polymers, Ions, Semiconducting wafers

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Proceedings Article | 19 March 2007 Paper

Scissionable bile acid nanostructures for lithography

Robert Meagley, Geeta Sharma, Ankur Guptab

Proceedings Volume 6517, 65171J (2007) https://doi.org/10.1117/12.712355

KEYWORDS: Dendrimers, Photoresist materials, Molecules, Lithography, Polymers, Nanostructures, Chemical elements, Chemistry, Lithium, Analog electronics

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SPIE Journal Paper | 1 October 2006

Resist deconstruction as a probe for innate material roughness

Theodore Fedynyshyn, Roger Sinta, David Astolfi, Russell Goodman, Alberto Cabral, Jeanette Roberts, Robert Meagley

JM3, Vol. 5, Issue 04, 043010, (October 2006) https://doi.org/10.1117/12.10.1117/1.2408410

KEYWORDS: Polymers, Surface roughness, Polymer thin films, Line edge roughness, Line width roughness, Photoresist processing, Profiling, Atomic force microscopy, Semiconducting wafers, Lithography

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Proceedings Article | 29 March 2006 Paper

Contributions to innate material roughness in resist

Jeanette Roberts, Robert Meagley, Theodore Fedynyshyn, Roger Sinta, David Astolfi, Russell Goodman, Alberto Cabral

Proceedings Volume 6153, 61533U (2006) https://doi.org/10.1117/12.655740

KEYWORDS: Polymers, Surface roughness, Line width roughness, Standards development, Semiconducting wafers, FT-IR spectroscopy, Extreme ultraviolet lithography, Photolysis, Atomic force microscopy, Lithography

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Proceedings Article | 29 March 2006 Paper

Deconstructing the resist to probe innate material roughness

T. H. Fedynyshyn, R. F. Sinta, D. K. Astolfi, A. Cabral, J. Roberts, R. Meagley

Proceedings Volume 6153, 615315 (2006) https://doi.org/10.1117/12.654437

KEYWORDS: Polymers, Surface roughness, Line edge roughness, Photoresist processing, Polymer thin films, Profiling, Lithography, Semiconducting wafers, Line width roughness, Silicon

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Proceedings Article | 14 May 2004 Paper

Silicon backbone polymers as EUV resists

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536438

KEYWORDS: Silicon, Polymers, Chlorine, Extreme ultraviolet, Polymerization, Lithography, Nitrogen, Absorbance, Transparency, Extreme ultraviolet lithography

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Proceedings Article | 12 June 2003 Paper

Intel's EUV resist development

Heidi Cao, Jeanette Roberts, Janel Dalin, Manish Chandhok, Robert Meagley, Eric Panning, Melissa Shell, Bryan Rice

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485095

KEYWORDS: Extreme ultraviolet, Line width roughness, Absorbance, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Lithography, Polymers, Line edge roughness

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Proceedings Article | 12 June 2003 Paper

Effects of processing parameters on line-width roughtness

Bryan Rice, Heidi Cao, Manish Chandhok, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485162

KEYWORDS: Line width roughness, Line edge roughness, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Silicon, Lithography, Ultrasonics, Ultrasonography, Edge roughness

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Proceedings Article | 12 June 2003 Paper

Novel silicon-containing polymers as photoresist materials for EUV lithography

Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485184

KEYWORDS: Silicon, Polymers, Polymerization, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Molybdenum, Transparency, Metals, Lithography

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Proceedings Article | 12 June 2003 Paper

Intel benchmarking and process integration of 157-nm resists

James Powers, Jeanette Roberts, Paul Zimmerman, Robert Meagley, E. Steve Putna, Uday Shah

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483730

KEYWORDS: Etching, Silicon, Line width roughness, Dry etching, Absorbance, Photoresist materials, Imaging systems, Electroluminescence, Optical lithography, Lithography

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Proceedings Article | 11 June 1999 Paper

Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography

Dario Pasini, Eric Low, Robert Meagley, Jean Frechet, C. Grant Willson, Jeff Byers

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350166

KEYWORDS: Polymers, Etching, Resistance, Optical lithography, Lithography, Glasses, Signal processing, Absorbance, Photoresist materials, Chemically amplified resists

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Proceedings Article | 29 June 1998 Paper

New approach to 193-nm photoresists: polyspironorbornane polymers

Robert Meagley, Linus Park, Jean Frechet

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312471

KEYWORDS: Polymers, Polymerization, Photoresist materials, Carbon, Lithography, Etching, Extreme ultraviolet lithography, Resistance, Metals, Excimer lasers

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Showing 5 of 13 publications

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