Robert P. Ebeling
at TNO
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Contamination, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Temperature metrology

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Oxidation

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Defect detection, Scattering, Scanners, Particles, Scanning electron microscopy, Scatterometry, Optical metrology, Semiconducting wafers, Signal detection

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