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Robert Rodriguez
at Cornell Univ
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Author
Publications (4)
Proceedings Article | 1 April 2009 Paper
High refractive index nanoparticle fluids for 193-nm immersion lithography
Markos Trikeriotis, Robert Rodriguez, Michael Zettel, Aristeidis Bakandritsos, Woo Jin Bae, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis
Proceedings Volume 7273, 72732A (2009) https://doi.org/10.1117/12.814408
KEYWORDS: Refractive index, Nanoparticles, Water, Immersion lithography, Hafnium, Particles, Absorption, Oxides, Fluid dynamics, Dynamic light scattering
Proceedings Article | 1 April 2009 Paper
High-index nanocomposite photoresist for 193-nm lithography
Proceedings Volume 7273, 727326 (2009) https://doi.org/10.1117/12.814154
KEYWORDS: Nanoparticles, Photoresist materials, Refractive index, Water, Ultraviolet radiation, Nanocomposites, Lithography, Immersion lithography, Semiconducting wafers, Absorption
Proceedings Article | 15 April 2008 Paper
Development and evaluation of 193nm immersion generation-three fluid candidates
Paul Zimmerman, Jeffrey Byers, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Naphtali O’Connor, Xuegong Lei, Nicholas Turro, Vladimir Liberman, Stephen Palmacci, Mordechai Rothschild, Neal Lafferty, Bruce Smith
Proceedings Volume 6923, 69230A (2008) https://doi.org/10.1117/12.772887
KEYWORDS: Nanoparticles, Refractive index, Absorbance, Metals, Oxides, Water, Nanocomposites, Transparency, Polarizability, Ultraviolet radiation
Proceedings Article | 15 April 2008 Paper
Development of an operational high refractive index resist for 193nm immersion lithography
Paul Zimmerman, Jeffrey Byers, Emil Piscani, Bryan Rice, Christopher Ober, Emmanuel Giannelis, Robert Rodriguez, Dongyan Wang, Andrew Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu
Proceedings Volume 6923, 692306 (2008) https://doi.org/10.1117/12.772871
KEYWORDS: Nanoparticles, Refractive index, Absorbance, Immersion lithography, Polymers, Lithography, Chemistry, Chlorine, Sulfur, Line edge roughness
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