Dr. Robert A. Stubbers Profile

Dr. Robert A. Stubbers

at Starfire Industries LLC

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Proceedings Article | 21 March 2007 Paper

Experimental results for an addressable xenon microdischarge EUV-source array for HVM lithography

Brian Jurczyk, Robert Stubbers, Darren Alman, Josh Rovey, Matthew Coventry

Proceedings Volume 6517, 65173G (2007) https://doi.org/10.1117/12.712321

KEYWORDS: Extreme ultraviolet, Plasma, Xenon, Mirrors, Light, Electrodes, Photodiodes, Lithography, Optical components, Reticles

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The joint specification projected in-band EUV power requirements at the intermediate focus will rise beyond 185W 2%- bw to maintain the necessary 80-100WPH throughput for economic viability. New improvements in photon efficiency and mask illumination are needed to reduce reflections and power demand, as well as improving source spatial uniformity. In 2006, Starfire presented a novel approach to the EUV source-optic architecture using a high-brightness light source array for direct integration within the illumination optical system. Spatial uniformity and Kohler illumination across the entrance pupil is achieved by dividing the incident light into discrete bundles on a fly's eye mirror. These light bundles form a secondary source image plane that is projected onto the pupil of the projection optics. This configuration allows electronic adjustment of partial coherence and depth of focus for improved lithographic contrast and resolving capability. By distributing total EUV power across discrete units, thermal and particle loadings become manageable without the need for exotic materials or cooling schemes and sources of contaminating debris are reduced. Experimental data from a 5×5 xenon-fed microdischarge source array is presented, demonstrating repetition rate and source addressability for illumination patterning and grayscaling capability. In addition, experimental data from xenon-based sources will be presented with a suite of plasma and optical diagnostic instruments, including conversion efficiency, spectral purity and debris generation. Projections for scaling to HVM conditions will also be presented.

Proceedings Article | 21 March 2007 Paper

Microdischarge EUV source array and illuminator design for a prototype lithography tool

B. Jurczyk, R. Stubbers, D. Alman, R. Hudyma, M. Thomas

Proceedings Volume 6517, 65170T (2007) https://doi.org/10.1117/12.712304

KEYWORDS: Fiber optic illuminators, Extreme ultraviolet, Mirrors, Light, Light sources, Multiplexing, Plasma, Optical components, Reticles, Prototyping

Read Abstract +

The joint specification projected in-band EUV power requirements at the intermediate focus will rise beyond 185W 2%-bw to maintain the necessary 80-100WPH throughput for economic viability. New improvements in photon efficiency and mask illumination are needed to reduce reflections and power demand, as well as improving source spatial uniformity. In 2006, Starfire Industries presented a microdischarge plasma light source concept for consideration as a potential HVM solution for high-power spatial and temporal multiplexing. Using a distributed array architecture, thermal and particle loadings become manageable when spread over 100s to 1000s of discrete units allowing power scalability. In addition, a key tenant is the potential for novel collection and illumination geometries that could simulate Kohler and pupil fill effects found in conventional fly's-eye mirror systems; thus leading to a reduction in optical elements and a factor of >5x increase in total throughput. A top-level illuminator optical design based on the microsource array technology is presented, as well as thoughts on illumination efficiency, reticle uniformity, partial coherence and uniformity of the pupil fill for a realistic EUV source array. In addition, experimental data from xenonbased sources will be presented with a suite of plasma and optical diagnostic instruments, including conversion efficiency.

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