Robert A. Wildfeuer
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Electrochemical etching, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Computer aided design, Metrology, Calibration, Finite element methods, Environmental monitoring

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

Proceedings Article | 10 March 2006 Paper
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Data modeling, Calibration, Photoresist processing, Optical proximity correction, Process modeling, Optical calibration, Diffusion, Coherence (optics), Statistical modeling, Model-based design

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Inspection, Reticles, Thin films, Cadmium, Lithography, Optical lithography, Optical simulations, 3D modeling, Performance modeling, Diffusion

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: 3D modeling, Photoresist processing, Absorption, 3D image processing, Lithography, Process modeling, Optical lithography, Algorithm development, Diffusion, Photoresist materials

Showing 5 of 6 publications
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