Dr. Roderick Köhle
Staff Engineer at Qimonda AG
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical lithography, Light scattering, Chromium, Computer simulations, Near field, Finite element methods, Photomasks, Critical dimension metrology, Chemical elements, Electromagnetism

Proceedings Article | 18 June 2007 Paper
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Nanostructures, Diffraction, Optical lithography, Etching, Computer simulations, Finite element methods, Photomasks, Chemical elements, Electromagnetism, Radio propagation

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Diffraction, Phase shifting, Transparency, Lithographic illumination, Polarization, Scattering, Photomasks, Optical proximity correction, Diffraction gratings

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Polarization, Image processing, Computer simulations, Finite element methods, Photomasks, Chemical elements, Photoresist processing, Airborne remote sensing

Showing 5 of 20 publications
Conference Committee Involvement (2)
Modeling Aspects in Optical Metrology
15 June 2009 | Munich, Germany
Modeling Aspects in Optical Metrology
18 June 2007 | Munich, Germany
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