Mr. Rodney J. Rigby Profile

Rodney J. Rigby

at Cadence Design Systems Inc

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Proceedings Article | 30 October 2007 Paper

Multi-layer reticle (MLR) strategy application to double-patterning/double-exposure for better overlay error control and mask cost reduction

Yasuhisa Yamamoto, Rodney Rigby, Jason Sweis

Proceedings Volume 6730, 67302X (2007) https://doi.org/10.1117/12.746158

KEYWORDS: Photomasks, Semiconducting wafers, Neodymium, Scanners, Lithography, Reticles, Electroluminescence, Manufacturing, Overlay metrology, Error control coding

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Double-patterning lithography / double-exposure lithography is believed to be a solution in order to enable the 32nm-Half-Pitch (HP) and below process node until EUV lithography infrastructure is ready. However, one of the biggest challenges is the overlay budget along with critical dimension (CD) control. In this paper, we propose that instead of using multiple masks for the DPL (STD DPL), multiple split patterns are printed on a single mask so that each pattern is separately or simultaneously exposed onto a wafer in order to reduce the mask-to-mask overlay error. This can also reduce the mask cost and mask manufacturing time compared with STD DPL, at the expense of reducing manufacturing throughput. We propose two ideas about how to place the split patterns in a single mask and simulate corresponding shot throughput comparisons. The results show that by using multi-layer reticle (MLR) strategy for splitting the original layout into 2 split patterns onto a single mask (Method I), we achieve: 1) reduction of the mask-to-mask overlay error factor 2) use of a single mask (reducing mask costs) and 3) reduction of wafer shot throughput to roughly 50% of that achieved by STD DPL. Also by using our new approach of placing multiple-split patterns to form the arrays within the mask scribe (Method II), we achieve: 1) reduction of the mask-to-mask overlay error factor 2) use of a single mask (reducing mask costs) and 3) drastically improved wafer shot throughput (at least 90% of the STD DPL, 180% of Method I).

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