Dr. Roman Caudillo Profile

Dr. Roman Caudillo

at Intel Corp

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Author

Publications (6)

Proceedings Article | 8 April 2011 Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Michael Leeson, Roman Caudillo, Terence Bacuita, Uday Shah, Manish Chandhok

Proceedings Volume 7969, 79692K (2011) https://doi.org/10.1117/12.879641

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Photoresist materials, Photoresist developing, Materials processing, Lithography, Etching, Scanning electron microscopy

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Proceedings Article | 23 March 2010 Paper

Aerial image improvements on the Intel MET

Roman Caudillo, Todd Younkin, Steve Putna, Alan Myers, Yashesh Shroff, Terence Bacuita, Grant Kloster, Erik Sohmen

Proceedings Volume 7636, 76363I (2010) https://doi.org/10.1117/12.849142

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Photoresist materials, Semiconducting wafers, Printing, Modulation, Photomasks, Photoresist developing

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Proceedings Article | 20 March 2010 Paper

Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features

Grant Kloster, Ted Liang, Todd Younkin, Ernisse Putna, Roman Caudillo, Il-Seok Son

Proceedings Volume 7636, 76360M (2010) https://doi.org/10.1117/12.845740

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Line width roughness, Optical lithography, Photoresist materials, Lithography, Metrology

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Proceedings Article | 20 March 2010 Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Roman Caudillo, Manish Chandhok

Proceedings Volume 7636, 76360P (2010) https://doi.org/10.1117/12.842408

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Lithography, Photoresist processing, Optical lithography, Photoresist materials, Lithographic illumination, Lead

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Proceedings Article | 18 March 2009 Paper

Tracking down sources of carbon contamination in EUVL exposure tools

C. Tarrio, R. Vest, T. Lucatorto, R. Caudillo

Proceedings Volume 7271, 727112 (2009) https://doi.org/10.1117/12.813684

KEYWORDS: Molecules, Carbon, Extreme ultraviolet lithography, Statistical analysis, Ions, Contamination, Photoresist materials, Gases, Liquids, Nitrogen

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Proceedings Article | 18 March 2009 Paper

Carbon film growth on model electron-irradiated MLM cap layer: interaction of benzene and MMA vapor with TiO2 surface

B. Yakshinskiy, S. Zalkind, R. Bartynski, R. Caudillo, T. Madey

Proceedings Volume 7271, 727110 (2009) https://doi.org/10.1117/12.814385

KEYWORDS: Carbon, Telescopic pixel displays, Adsorption, Extreme ultraviolet lithography, Molecules, Temperature metrology, Mirrors, Extreme ultraviolet, Photons, Titanium dioxide

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Showing 5 of 6 publications

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