Dr. Roman Sappey
Director of Technology at KLA Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74881X (2009) https://doi.org/10.1117/12.833285
KEYWORDS: Critical dimension metrology, Single crystal X-ray diffraction, Beam propagation method, Magnetism, Process control, Metrology, Nanoimprint lithography, Scatterometry, Manufacturing, Semiconductors

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