Prof. Roxann L. Engelstad
Professor and Chair
SPIE Involvement:
Author
Publications (102)

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Data modeling, Electrodes, Particles, Distortion, Printing, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Interferometers, Photography, Interferometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Beam expanders, Computer aided design

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Polishing, Scanners, Distortion, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Semiconductors, Reticles, Particles, Dielectrics, Photography, Fourier transforms, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Protactinium

Showing 5 of 102 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 16 June 2003

SPIE Conference Volume | 1 July 2002

Conference Committee Involvement (17)
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Showing 5 of 17 Conference Committees
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