Dr. Roy Anunciado Profile

Dr. Roy Anunciado

Physicist at ASML Netherlands BV

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Author

Publications (5)

Proceedings Article | 13 March 2018 Paper

Assessment of local variability by high-throughput e-beam metrology for prediction of patterning defect probabilities

Fuming Wang , Stefan Hunsche, Roy Anunciado, Antonio Corradi , Hung Yu Tien, Peng Tang, Junwei Wei, Yongjun Wang, Wei Fang, Patrick Wong, Anton van Oosten, Koen van Ingen Schenau, Bram Slachter

Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII

KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

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Proceedings Article | 28 March 2017 Paper

Efficient hybrid metrology for focus, CD, and overlay

W. T. Tel, B. Segers, R. Anunciado, Y. Zhang, P. Wong, T. Hasan, C. Prentice

Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI

KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Sensors, Etching, Scanners, Critical dimension metrology, Semiconducting wafers, Overlay metrology

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Proceedings Article | 15 March 2016 Paper

CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM

Young Ki Kim, Pavan Samudrala, Juan-Manuel Gomez, Peter Nikolsky, Roy Anunciado, Maria Barkelid, Shawn Lee, Ye Tian, Justin Hanson

Proc. SPIE. 9780, Optical Microlithography XXIX

KEYWORDS: Reticles, Metrology, Scanners, Laser processing, Laser scanners, Photomasks, 3D scanning, Critical dimension metrology, Laser metrology, Semiconducting wafers

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Proceedings Article | 8 March 2016 Paper

Process window limiting hot spot monitoring for high-volume manufacturing

Marinus Jochemsen, Roy Anunciado, Vadim Timoshkov, Stefan Hunsche, Xinjian Zhou, Chris Jones, Neal Callan

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Lithography, Metrology, Optical lithography, Defect detection, Detection and tracking algorithms, Data modeling, Deep ultraviolet, Sensors, Etching, Scanners, Inspection, Scanning electron microscopy, Process control, High volume manufacturing, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

CD uniformity optimization at volume ramp up stage for new product introduction

Jin-Soo Kim, Won-Kwang Ma, Young-Sik Kim, Myoung-Soo Kim, Won-Taik Kwon, Sung-Ki Park, Peter Nikolsky, Marian Otter, Maryana Escalante Marun, Roy Anunciado, Kyu-Tae Sun, Greet Storms, Ewould van West

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Semiconductors, Optical lithography, Etching, Manufacturing, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Overlay metrology

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