Dr. Roy Anunciado
Physicist at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Metrology, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Sensors, Etching, Scanners, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Reticles, Metrology, Scanners, Laser processing, Laser scanners, Photomasks, 3D scanning, Critical dimension metrology, Laser metrology, Semiconducting wafers

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Defect detection, Detection and tracking algorithms, Data modeling, Deep ultraviolet, Sensors, Etching, Scanners, Inspection, Scanning electron microscopy, Process control, High volume manufacturing, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Manufacturing, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Overlay metrology

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