Dr. Runyuan Han
at KLA MIE GmbH
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 12 October 2018 Presentation
Proceedings Volume 10810, 108100A (2018) https://doi.org/10.1117/12.2506286

Proceedings Article | 19 September 2018 Paper
Proceedings Volume 10775, 107750G (2018) https://doi.org/10.1117/12.2325627
KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Overlay metrology, Metrology, Manufacturing, Lithography

Proceedings Article | 12 June 2018 Paper
Proceedings Volume 10807, 108070M (2018) https://doi.org/10.1117/12.2325128
KEYWORDS: Extreme ultraviolet, Metrology, Photomasks, Extreme ultraviolet lithography, Overlay metrology, Semiconducting wafers, Reticles

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105851V (2018) https://doi.org/10.1117/12.2303959
KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Metrology, Overlay metrology, Manufacturing, Time metrology, Lithography

Proceedings Article | 13 July 2017 Paper
Proceedings Volume 10454, 104540V (2017) https://doi.org/10.1117/12.2279676
KEYWORDS: Metrology, Photomasks, Optical lithography, Immersion lithography, Air contamination, Optical properties, Detection and tracking algorithms, High volume manufacturing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top