Dr. Ryan P. Deschner Profile

Dr. Ryan P. Deschner

Chief Research Officer at NanoHybrids Inc

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Publications (9)

Proceedings Article | 28 February 2018 Presentation + Paper

Co-registered photoacoustic and fluorescent imaging of a switchable nanoprobe based on J-aggregates of indocyanine green

Diego Dumani, Hans-Peter Brecht, Vassili Ivanov, Ryan Deschner, Justin Harris, Kimberly Homan, Jason Cook, Stanislav Emelianov, Sergey Ermilov

Proceedings Volume 10494, 104942W (2018) https://doi.org/10.1117/12.2291262

KEYWORDS: Nanoprobes, Luminescence, Photoacoustic spectroscopy, Molecular imaging, Photoacoustic imaging, Indocyanine green, Preclinical imaging, 3D image processing, Photoacoustic tomography, Cancer

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SPIE Journal Paper | 16 July 2014 Open Access

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson

JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302

KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

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Proceedings Article | 3 April 2010 Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

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Proceedings Article | 31 March 2010 Paper

Development of spin-on hard mask materials under resist in nano imprint lithography

Satoshi Takei, Tsuyoshi Ogawa, Ryan Deschner, Kane Jen, Makoto Hanabata, C. Willson

Proceedings Volume 7639, 76391C (2010) https://doi.org/10.1117/12.853200

KEYWORDS: Lithography, Photomasks, Ultraviolet radiation, Etching, Photoresist processing, Nanoimprint lithography, Electron beam lithography, Oxygen, Resistance, Silicon

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SPIE Journal Paper | 1 January 2010

Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond

Gregory McIntyre, Michael Hibbs, Jaione Tirapu-Azpiroz, Geng Han, Scott Halle, Thomas Faure, Ryan Deschner, Bradley Morgenfeld, Sridhar Ramaswamy, Alfred Wagner

JM3, Vol. 9, Issue 01, 013010, (January 2010) https://doi.org/10.1117/12.10.1117/1.3295712

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Lithography, Opacity, Semiconducting wafers, Data modeling, Electromagnetism, Calibration, Phase shifting

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Proceedings Article | 1 April 2008 Paper

Reflectivity-induced variation in implant layer lithography

Todd Bailey, Greg McIntyre, Bidan Zhang, Ryan Deschner, Sohan Mehta, Won Song, Hyung-Rae Lee, Yu Hue, MaryJane Brodsky

Proceedings Volume 6924, 69244F (2008) https://doi.org/10.1117/12.773102

KEYWORDS: Critical dimension metrology, Oxides, Reflectivity, Lithography, Semiconducting wafers, Photomasks, Chemical mechanical planarization, Silicon, Control systems, Etching

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Proceedings Article | 27 March 2007 Paper

Optimization of DUV lithography for high-energy well implantation

Ryan Deschner, Seong-Dong Kim, Randy Mann, Mark Stidham, Greg Johnson, JoAnn Rolick

Proceedings Volume 6520, 65204K (2007) https://doi.org/10.1117/12.711486

KEYWORDS: Photoresist materials, Lithography, Ions, Scattering, Tolerancing, Photomasks, Scanning electron microscopy, Silicon, Process control, Deep ultraviolet

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Proceedings Article | 9 March 2006 Paper

Characterization of imaging performance for immersion lithography at NA=0.93

Dario Gil, Jaione Tirapu-Azpiroz, Ryan Deschner, Timothy Brunner, Carlos Fonseca, Jennifer Fullam, Dan Corliss, K. Auschnitt, Peter Vanoppen

Proceedings Volume 6154, 615405 (2006) https://doi.org/10.1117/12.656545

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Immersion lithography, Monte Carlo methods, Scanners, Photomasks, Optical proximity correction, Optical lithography, Lithography, Manufacturing

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Proceedings Article | 14 May 2004 Paper

Implications of immersion lithography on 193-nm photoresists

J. Christopher Taylor, Charles Chambers, Ryan Deschner, Robert LeSuer, Willard Conley, Sean Burns, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535875

KEYWORDS: Water, Photoresist materials, Polymers, Semiconducting wafers, Scintillation, Immersion lithography, Liquids, Refraction, Silicon, Spectroscopic ellipsometry

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Showing 5 of 9 publications

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