Dr. Ryan H. Miyakawa
Project Scientist at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Multilayers, Optical lithography, Phase contrast, Reflection, Reflectivity, Photomasks, Extreme ultraviolet, Zone plates, 3D image processing, Phase shifts

Proceedings Article | 23 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Multilayers, Image processing, Light scattering, Constructive interference, Printing, Reflectometry, Image quality, Extreme ultraviolet, Destructive interference, Phase shifts

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Logic, Phase shift keying, Lens design, 3D modeling, Phase imaging, Photomasks, Extreme ultraviolet, Charge-coupled devices, Phase measurement, Phase shifts

Proceedings Article | 20 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Microscopes, Phase contrast, Phase imaging, Objectives, Photomasks, Extreme ultraviolet, Phase measurement, Zone plates, Phase shifts, Near field optics

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Diffraction, Multilayers, Scattering, Reflectivity, 3D modeling, Phase retrieval, Scatterometry, Reflectometry, Photomasks, Extreme ultraviolet

Showing 5 of 36 publications
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