Ryoji Hagiwara
Manager of Mask Repair at SII Nanotechnology Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 22 July 2014 Paper
G. Ambrosi, Y. Awane, H. Baba, A. Bamba, M. Barceló, U. Barres de Almeida, J. Barrio, O. Blanch Bigas, J. Boix, L. Brunetti, E. Carmona, E. Chabanne, M. Chikawa, R. Colin, J. Cortina, J. Contreras, F. Dazzi, A. De Angelis, G. Deleglise, C. Delgado, C. Díaz, A. Fiasson, D. Fink, N. Fouque, L. Freixas, C. Fruck, A. Gadola, R. García, D. Gascon, N. Geffroy, N. Giglietto, F. Giordano, F. Grañena, S. Gunji, R. Hagiwara, N. Hamer, Y. Hanabata, T. Hassan, K. Hatanaka, K. Hirotani, S. Inoue, Y. Inoue, K. Ioka, C. Jablonski, M. Kagaya, H. Katagiri, T. Kishimoto, K. Kodani, K. Kohri, Y. Konno, S. Koyama, H. Kubo, J. Kushida, G. Lamanna, T. Le Flour, E. Lorenz, R. López, M. López-Moya, P. Majumdar, A. Manalaysay, M. Mariotti, G. Martínez, M. Martínez, D. Mazin, J. Miranda , R. Mirzoyan, I. Monteiro, A. Moralejo, K. Murase, S. Nagataki, D. Nakajima, T. Nakamori, K. Nishijima, K. Noda, A. Nozato, Y. Ohira, M. Ohishi, H. Ohoka, A. Okumura, R. Orito, J. Panazol, D. Paneque, R. Paoletti, J. Paredes, G. Pauletta, S. Podkladkin, J. Prast, R. Rando, O. Reimann, M. Ribó, S. Rosier-Lees, K. Saito, T. Saito, Y. Saito, N. Sakaki, R. Sakonaka, A. Sanuy, H. Sasaki, M. Sawada, V. Scalzotto, S. Schultz, T. Schweizer, T. Shibata, S. Shu, J. Sieiro, V. Stamatescu, S. Steiner, U. Straumann, R. Sugawara, H. Tajima, H. Takami, S. Tanaka, M. Tanaka, L. Tejedor, Y. Terada, M. Teshima, T. Totani, H. Ueno, K. Umehara, A. Vollhardt, R. Wagner, H. Wetteskind, T. Yamamoto, R. Yamazaki, A. Yoshida, T. Yoshida, T. Yoshikoshi
Proc. SPIE. 9145, Ground-based and Airborne Telescopes V
KEYWORDS: Telescopes, Mirrors, Electronics, Cameras, Reflectivity, Physics, Space telescopes, Gamma radiation, Optical instrument design, Atmospheric Cherenkov telescopes

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Image processing, Reflectivity, Chromium, Scanning electron microscopy, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Chemical species, Ions, Silicon, Reflectivity, Chromium, Extreme ultraviolet, Molybdenum, Gallium, Absorption

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Image processing, Reflectivity, Scanning electron microscopy, Bridges, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Isotropic etching

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Chemical species, Ions, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Gallium, Absorption

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top