Ryoji Yoshikawa
at Kioxia Holdings Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 29 January 2020 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Quartz, Inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Signal to noise ratio, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Target detection, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Optical lithography, Etching, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Optical inspection, Scatterometry, Process control, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 13 publications
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