Dr. Sajan Marokkey Profile

Dr. Sajan Marokkey

at Synopsys

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 6 September 2018 Paper

Paper

Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn

Proceedings Volume 10586, 105860R (2018) https://doi.org/10.1117/12.2297344

KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2017 Paper

Paper

Rigorous simulation of EUV mask pellicle

Yulu Chen, Xiangyu Zhou, Ulrich Klostermann, Lei Sun, Obert Wood, Mariya Braylovska, Sajan Marokkey, Francis Goodwin

Proceedings Volume 10451, 104510S (2017) https://doi.org/10.1117/12.2280339

KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Extreme ultraviolet lithography, Transmittance, Temporal coherence, Particles, Nickel, High volume manufacturing

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Proceedings Article | 27 April 2017 Presentation + Paper

Presentation + Paper

Advanced fast 3D DSA model development and calibration for design technology co-optimization

Kafai Lai, Balint Meliorisz, Thomas Muelders, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Wolfgang Demmerle, Chi-Chun Liu, Cheng Chi, Jing Guo

Proceedings Volume 10144, 101440H (2017) https://doi.org/10.1117/12.2260379

KEYWORDS: 3D modeling, Calibration, Data modeling, Optical lithography, Nanotechnology, Very large scale integration, System on a chip, Logic, Research facilities

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Proceedings Article | 24 March 2017 Paper

Paper

Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

Yudhishthir Kandel, Jonathan Chandonait, Lawrence Melvin, Sajan Marokkey, Qiliang Yan, Steven Grzeskowiak, Benjamin Painter, Gregory Denbeaux

Proceedings Volume 10143, 101430B (2017) https://doi.org/10.1117/12.2258063

KEYWORDS: Extreme ultraviolet lithography, Data modeling, Photoresist materials, Lithography, Optical proximity correction, Optical lithography, High volume manufacturing, Photons, Extreme ultraviolet, Semiconducting wafers, Electron beams, Scattering

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Proceedings Article | 22 March 2016 Paper

Paper

Modeling and parameter tuning for templated directed self-assembly

B. Meliorisz, T. Mülders, H.-J. Stock, S. Marokkey, W. Demmerle, K. Lai, A. Raghunathan, P. Dhagat

Proceedings Volume 9777, 97770Z (2016) https://doi.org/10.1117/12.2219158

KEYWORDS: Calibration, Data modeling, 3D modeling, Computational lithography, Lithography, Optimization (mathematics), Directed self assembly, Optical lithography, Metals, Photomasks, Scanning electron microscopy, Statistical analysis, Picosecond phenomena, Interfaces

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SPIE Journal Paper | 15 May 2015 Open Access

Open Access

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

JM3, Vol. 14, Issue 02, 023505, (May 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023505

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

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Proceedings Article | 16 March 2015 Paper

Paper

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas Pistor, Gregory Denbeaux

Proceedings Volume 9422, 94220Q (2015) https://doi.org/10.1117/12.2175842

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Chemical species, Extreme ultraviolet lithography, Inspection, Monte Carlo methods, Computer simulations, Waveguides, Transmission electron microscopy

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SPIE Journal Paper | 1 October 2010

Electrical validation of through-process optical proximity correction verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

JM3, Vol. 9, Issue 04, 041303, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514703

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology

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Proceedings Article | 25 September 2010 Paper

Paper

Physical resist model calibration for implant level using laser-written photomasks

Dongbing Shao, Bidan Zhang, Sajan Marokkey, Todd Bailey, Derren Dunn, Emily Gallagher, Yea-Sen Lin, Takashi Murakami, Seiji Nakagawa, Chandrasekhar Sarma, Mohamed Talbi

Proceedings Volume 7823, 78230U (2010) https://doi.org/10.1117/12.865131

KEYWORDS: Photomasks, Data modeling, Calibration, 3D modeling, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Process modeling, Silicon

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Proceedings Article | 3 April 2010 Paper

Paper

3D physical modeling for patterning process development

Chandra Sarma, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Sajan Marokkey, Mohamed Talbi

Proceedings Volume 7641, 76410B (2010) https://doi.org/10.1117/12.846637

KEYWORDS: 3D modeling, Critical dimension metrology, Data modeling, Process modeling, Scanning electron microscopy, Semiconducting wafers, Etching, Optical lithography, Printing, 3D image processing

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Proceedings Article | 2 April 2010 Paper

Paper

Electrical validation of through process OPC verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

Proceedings Volume 7638, 76380U (2010) https://doi.org/10.1117/12.846572

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Optical simulations, Process modeling, Optical lithography, Optical components, Image processing

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Proceedings Article | 13 March 2010 Paper

Paper

Three-dimensional physical photoresist model calibration and profile-based pattern verification

Mohamed Talbi, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Masashi Fujimoto, John Nickel, No Young Chung, Sajan Marokkey, Si Hyeung Lee, Chandrasekhar Sarma, Dongbing Shao, Ramya Viswanathan

Proceedings Volume 7640, 76401D (2010) https://doi.org/10.1117/12.846466

KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

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Proceedings Article | 16 November 2007 Paper

Paper

Validating optical proximity correction with models, masks, and wafers

Sajan Marokkey, Edward Conrad, Emily Gallagher, Hidehiro Ikeda, James Bruce, Mark Lawliss

Proceedings Volume 6730, 67302Q (2007) https://doi.org/10.1117/12.746685

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Photomasks, SRAF, Data modeling, Failure analysis, Image processing, Lithography, Photoresist materials

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Proceedings Article | 18 August 2000 Paper

Paper

Investigations on the impacts of misalignment in the integration of 0.18-u multilevel interconnect

Teck Jung Tang, Juan Boon Tan, Sajan Marokkey, Tae Lee, Alan Cuthbertson

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395716

KEYWORDS: Process control, Metals, Silicon, Semiconducting wafers

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Proceedings Article | 3 September 1999 Paper

Paper

Critical structure characterization in 0.25-um metal masking

Chung Lee, Wei Wen Ma, Sajan Marokkey, Alex Cheng

Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361319

KEYWORDS: Metals, Deep ultraviolet, Electroluminescence, Lithography, Photoresist processing, Printing, Optical lithography, Semiconductor manufacturing, Materials processing, Control systems

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Proceedings Article | 14 June 1999 Paper

Paper

Alignment strategy for metal layers after W-CMP

Sajan Marokkey, Juan Boon Tan, Yan Tak, Alex Cheng

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350792

KEYWORDS: Optical alignment, Semiconducting wafers, Chemical mechanical planarization, Metals, Signal processing, Overlay metrology, Diffraction, Sensors, Metrology, Tungsten

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SPIE Journal Paper | 1 September 1997

Time delay and integration imaging for inspection and profilometry of moving objects

Sajan Marokkey, Cho Tay, Huai Shang, Anand Asundi

OE, Vol. 36, Issue 09, (September 1997) https://doi.org/10.1117/12.10.1117/1.601497

KEYWORDS: Inspection, Sensors, Fourier transforms, Cameras, Modulation, Semiconductor lasers, Imaging systems, Line scan sensors, Profiling, Scanners

SPIE Journal Paper | 1 June 1996

Digital drum camera for dynamic recording

Anand Asundi, Sajan Marokkey

OE, Vol. 35, Issue 06, (June 1996) https://doi.org/10.1117/12.10.1117/1.600746

KEYWORDS: Cameras, Photoelasticity, Digital cameras, Digital recording, Charge-coupled devices, Inspection, Sensors, Imaging systems, Semiconductor lasers, Video

Proceedings Article | 30 May 1995 Paper

Paper

Low-cost digital dynamic visualization system

Anand Asundi, M. Sajan

Proceedings Volume 2513, (1995) https://doi.org/10.1117/12.209612

KEYWORDS: Cameras, Light emitting diodes, Photoelasticity, Visualization, Charge-coupled devices, Photography, Fluid dynamics, Imaging systems, Digital recording, Dynamical systems

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Proceedings Article | 27 March 1995 Paper

Paper

High-speed TDI imaging for peripheral inspection

Anand Asundi, Marokkey Sajan, Gaylord Olson, Jo Walker

Proceedings Volume 2423, (1995) https://doi.org/10.1117/12.205504

KEYWORDS: Cameras, Moire patterns, Inspection, Modulation, Imaging systems, Machine vision, Fringe analysis, Semiconductor lasers, Fourier transforms, Structured light

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Proceedings Article | 3 October 1994 Paper

Paper

Digital moire applications in automated inspection

Anand Asundi, Sajan Marokkey, Gaylord Olson, Jo Walker

Proceedings Volume 2347, (1994) https://doi.org/10.1117/12.188738

KEYWORDS: Moire patterns, Inspection, Cameras, Machine vision, Charge-coupled devices, Imaging systems, Sensors, Visualization, Semiconductor lasers, Structured light

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SPIE Journal Paper | 1 September 1994

Low-cost digital polariscope for dynamic photoelasticity

Anand Asundi, Sajan Marokkey

OE, Vol. 33, Issue 09, (September 1994) https://doi.org/10.1117/12.10.1117/12.177512

KEYWORDS: Photoelasticity, Light emitting diodes, Cameras, CCD cameras, Fringe analysis, Photography, Digital recording, Visualization, Imaging systems, Stress analysis

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SPIE Journal Paper | 1 August 1994

360-deg profilometry: new techniques for display and acquisition

Anand Asundi, Chi-Shing Chan, Sajan Marokkey

OE, Vol. 33, Issue 08, (August 1994) https://doi.org/10.1117/12.10.1117/12.176507

KEYWORDS: Moire patterns, Modulation, Data acquisition, Semiconductor lasers, Cameras, Head, Defect detection, Phase shifting, Imaging systems, Structured light

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Proceedings Article | 6 May 1993 Paper

Paper

Distortion and defect identification on curved objects

Anand Asundi, Marokkey Sajan

Proceedings Volume 1907, (1993) https://doi.org/10.1117/12.144811

KEYWORDS: Distortion

Showing 5 of 24 publications

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