Dr. Samir S. Ellwi
EUV Dev Manager at Adlyte
SPIE Involvement:
Publications (8)

SPIE Journal Paper | 11 June 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Tin, Extreme ultraviolet lithography, Ions, Light sources, Mirrors, Lithography, Inspection, Laser applications

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical filters, Mirrors, Contamination, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Coded apertures, Zirconium, Plasma, Tin

Proceedings Article | 29 March 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Metrology, Manufacturing, Inspection, Solids, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 28 February 2009 Paper
Proc. SPIE. 7193, Solid State Lasers XVIII: Technology and Devices
KEYWORDS: Thin films, Optical lithography, Electrodes, Glasses, Coating, Laser processing, Laser applications, Nd:YAG lasers, Laser ablation, Plasma display panels

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Laser applications, Laser development, Multiplexing, Semiconductor lasers, Xenon, Diodes, Extreme ultraviolet, Pulsed laser operation, Plasma, Tin

Showing 5 of 8 publications
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