Mr. Sang Jin Jo Profile

Sang Jin Jo

at SK Hynix

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 23 October 2015 Paper

Novel CD control of HTPSM by advanced process for sub-20nm tech

Sangjin Jo, Chungseon Choi, Sunghyun Oh, Taejoong Ha, Youngmo Lee, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351T (2015) https://doi.org/10.1117/12.2196938

KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

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Proceedings Article | 9 September 2013 Paper

Analysis of EUV mask durability under various absorber etch conditions

Dong Wook Lee, Sang Jin Jo, Sung Hyun Oh, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 8880, 88801Y (2013) https://doi.org/10.1117/12.2026206

KEYWORDS: Etching, Ruthenium, Photomasks, Reflectivity, Extreme ultraviolet, Multilayers, Semiconducting wafers, Ultraviolet radiation, Scanning probe microscopy, Transmission electron microscopy

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Proceedings Article | 8 November 2012 Paper

Advanced photomask fabrication process to increase pattern reliability for sub-20nm node

Dong Shin, Sang Jo, Hee Jang, Yun Hong, Dae Hwang, Chung Choi, Dong Jang, Ho Jung, Tae Ha, Sang Kim, Dong Yim

Proceedings Volume 8522, 85220R (2012) https://doi.org/10.1117/12.964974

KEYWORDS: Etching, Chromium, Photomasks, Particles, Critical dimension metrology, Inspection, Reliability, Optics manufacturing, Manufacturing

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Proceedings Article | 1 November 2007 Paper

Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks

Jun Chun, Taejoong Ha, Hoyong Jung, Sangjin Jo, Oscar Han

Proceedings Volume 6730, 673044 (2007) https://doi.org/10.1117/12.746638

KEYWORDS: Light sources, Quartz, Floods, Optical lithography, Phase shifts, Photoresist processing, Photomasks, Chromium, Transmittance, Optical properties

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Proceedings Article | 30 October 2007 Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Sang Jin Jo, Ho Yong Jung, Dong Wook Lee, Jae Cheon Shin, Jea Young Jun, Tae Joong Ha, Oscar Han

Proceedings Volume 6730, 673008 (2007) https://doi.org/10.1117/12.746646

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photomasks, Reliability, Electron beams, Scanning electron microscopy, Process control, Semiconductors

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