Sang Jin Jo
at SK Hynix
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Image processing, Chromium, Scanning electron microscopy, Transmission electron microscopy, Signal processing, Photomasks, Double patterning technology, Critical dimension metrology, Phase shifts

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Multilayers, Etching, Ultraviolet radiation, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Semiconducting wafers, Ruthenium

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Particles, Manufacturing, Reliability, Inspection, Chromium, Photomasks, Critical dimension metrology, Optics manufacturing

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Light sources, Optical lithography, Optical properties, Quartz, Chromium, Transmittance, Photomasks, Photoresist processing, Floods, Phase shifts

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Electron beams, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology

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