CONFERENCE PROCEEDINGS
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Sang Uhk Rhie
at Synopsys Inc
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Publications (3)
Proceedings Article | 30 July 2002 Paper
Hybrid PPC methodology and implementation in the correction of etch proximity
Chul-Hong Park, Sang-Uhk Rhie, Soo-Han Choi, Dong-Hyun Kim, Ji-Soong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474586
KEYWORDS: Critical dimension metrology, Etching, Model-based design, Instrument modeling, Performance modeling, Image segmentation, Data modeling, Cadmium, Data corrections, Lithography
Proceedings Article | 14 September 2001 Paper
Improvement of metal photo process margin with OPC and CMP for 0.14 um DRAM technology node and beyond
Dong-il Bae, Jun-Sik Bae, Seung-Won Sung, Ji-Soong Park, Sang-Uhk Rhie, Dong-Won Shin, Tae-Young Chung, Kinam Kim
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435684
KEYWORDS: Optical proximity correction, Metals, Chemical mechanical planarization, Photomasks, Manufacturing, Lithography, Optical lithography, Data corrections, Semiconductors, Electronics
Proceedings Article | 5 July 2000 Paper
Optical proximity correction considering mask manufacturability and its application to 0.25-um DRAM for enhanced device performance
Chul-Hong Park, Sang-Uhk Rhie, Ji-Hyeon Choi, Ji-Soong Park, Hyeong-Weon Seo, Yoo-Hyon Kim, Young-Kwan Park, Woo-Sung Han, Won-Seong Lee, Jeong-Taek Kong
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388939
KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Inspection, Manufacturing, Etching, Optics manufacturing, Data corrections, Cadmium, Mask making
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