Mr. Sang-Uk Lee Profile

Sang-Uk Lee

at MagnaChip Semiconductor Ltd

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Author

Publications (7)

Proceedings Article | 7 March 2008 Paper

90nm node contact hole patterning through applying model based OPC in KrF lithography

Young-Doo Jeon, Sang-Uk Lee, Jaeyoung Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6924, 69242W (2008) https://doi.org/10.1117/12.773075

KEYWORDS: Optical proximity correction, Lithography, Critical dimension metrology, Photomasks, Optical lithography, Lithographic illumination, Semiconducting wafers, Resolution enhancement technologies, Image processing, Scanners

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Proceedings Article | 16 November 2007 Paper

Fundamental study on the error factor for sub 90nm OPC modeling

Hyesung Lee, Sang-Uk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6730, 673058 (2007) https://doi.org/10.1117/12.746821

KEYWORDS: Optical proximity correction, Systems modeling, Data modeling, Diffusion, Model-based design, Calibration, Lithography, Critical dimension metrology, Process modeling, Image processing

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Proceedings Article | 1 November 2007 Paper

Application of modified jog-fill DRC rule on LFD OPC flow

Young-Mi Kim, Sang-Uk Lee, Jea-Hyun Kang, Jea-Hee Kim, Kee-Ho Kim

Proceedings Volume 6730, 67303W (2007) https://doi.org/10.1117/12.746811

KEYWORDS: Optical proximity correction, Semiconducting wafers, Lithography, Metals, Photomasks, Databases, Reticles, Optical lithography, Logic, Bridges

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Proceedings Article | 5 April 2007 Paper

Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique

Young-Doo Jeon, Sungho Jun, Jae-Hyun Kang, Sang-Uk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6518, 65183W (2007) https://doi.org/10.1117/12.712016

KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Diffraction, Data modeling, Process modeling, Optical properties, Semiconductor manufacturing, Bridges

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Proceedings Article | 4 April 2007 Paper

Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy

Yeon-Ah Shim, Jaehyun Kang, Sang-Uk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6518, 65180C (2007) https://doi.org/10.1117/12.711936

KEYWORDS: Data modeling, Critical dimension metrology, Optical proximity correction, Atomic force microscopy, Scanning electron microscopy, Semiconducting wafers, Wafer-level optics, Statistical modeling, Electron beams, Metrology

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Proceedings Article | 21 March 2007 Paper

The study for increasing efficiency of OPC verification by reducing false errors from bending pattern by using different size of CD error non-checking area with various corner lengths

Sang-Uk Lee, Yong-Suk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6521, 65210S (2007) https://doi.org/10.1117/12.711959

KEYWORDS: Optical proximity correction, Error analysis, Optical calibration, Semiconductors, Inspection, Resolution enhancement technologies, Image filtering, Electronic design automation, Lithography, Bridges

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Proceedings Article | 21 March 2007 Paper

Application of enhanced dynamic fragmentation to minimize false error from post OPC verification

Jae-Hyun Kang, Sang uk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6521, 65210U (2007) https://doi.org/10.1117/12.711950

KEYWORDS: Optical proximity correction, Bridges, Model-based design, Photomasks, Neodymium, Lithography, Data modeling, System on a chip, Logic devices, Process modeling

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Showing 5 of 7 publications

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