Sang-Uk Lee
at MagnaChip Semiconductor Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Diffusion, Optical proximity correction, Critical dimension metrology, Systems modeling, Model-based design, Process modeling

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Databases, Metals, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Diffraction, Optical lithography, Data modeling, Optical properties, Bridges, Photomasks, Semiconductor manufacturing, Optical proximity correction, Process modeling

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Wafer-level optics, Electron beams, Metrology, Data modeling, Atomic force microscopy, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling

Showing 5 of 7 publications
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