Dr. Sangwook Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (15)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconductors, Electronics, Optical lithography, Graphics processing units, Computer simulations, Optical proximity correction, Tolerancing, Communication engineering

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Reticles, Logic, Lenses, Wavefronts, Zernike polynomials, Photomasks, Logic devices, Binary data

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Calibration, Etching, Control systems, Scanning electron microscopy, Photomasks, Transistors, Critical dimension metrology, Performance modeling, Personal protective equipment, Instrument modeling

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Image segmentation, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Process modeling

Proceedings Article | 12 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Polymers, Diffusion, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Instrument modeling

Showing 5 of 15 publications
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