Mr. Sang-Yong Yu Profile

Sang-Yong Yu

Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 9 September 2013 Paper

Mask automation: need a revolution in mask makers and equipment industry

Seong-yong Moon, Sang-yong Yu, Young-hwa Noh, Ki-jung Son, Hyun-Joo Lee, Han-Ku Cho

Proceedings Volume 8880, 888016 (2013) https://doi.org/10.1117/12.2025569

KEYWORDS: Photomasks, Manufacturing, Control systems, Process control, Semiconductors, Semiconducting wafers, Telecommunications, Wafer manufacturing, Mask making, Extreme ultraviolet

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Proceedings Article | 27 March 2007 Paper

The choice of mask in consideration of polarization effects at high-NA system

Sung-Hyuck Kim, Soon-Ho Kim, Sang-Yong Yu, Yong-Hoon Kim, Jeung-Woo Lee, Han-Ku Cho

Proceedings Volume 6520, 65204R (2007) https://doi.org/10.1117/12.711318

KEYWORDS: Photomasks, Polarization, Binary data, Optical lithography, Resolution enhancement technologies, Immersion lithography, Image enhancement, Lithography, Image quality, Phase shifts

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Proceedings Article | 28 June 2005 Paper

Monitoring system of CD error analysis for the 90-nm node mask manufacturing

Sang-Yong Yu, Soon-Ho Kim, Byung-Cheol Cha, Yong-Hoon Kim, Seung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617080

KEYWORDS: Photomasks, Chromium, Error analysis, Etching, Molybdenum, Manufacturing, Statistical analysis, Mask making, Edge roughness, Lithography

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Proceedings Article | 6 December 2004 Paper

Analysis of in-field uniformity on wafer considering exposure margin and MEEF

Byung-Cheol Cha, Seong-Yoon Kim, Soon-Ho Kim, Sang-Yong Yu, Chan-Uk Jeon, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569383

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Manufacturing, Photoresist processing, Wafer-level optics, Optical testing, Lithography, Transmittance, Error analysis

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Proceedings Article | 28 August 2003 Paper

Study of characteristics and control of haze contamination induced by photochemical reaction

Sung-Jae Han, Sang-Yong Yu, Moon-Gyu Sung, Yong-Hoon Kim, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504277

KEYWORDS: Air contamination, Contamination, Photomasks, Manufacturing, Inspection, Carbon, Contamination control, Lithography, Light sources, Transmittance

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