Dr. Sanjay K. Yedur Profile

Dr. Sanjay K. Yedur

Director, Product Management at Picarro Inc

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Author

Publications (18)

Proceedings Article | 26 May 2022 Poster + Paper

Chemical metrology: a novel approach to measuring critical airborne molecular contamination in photolithography and track tools in real-time

Fabin Shakila, Sanjay Yedur, Jeffrey Headrick, Chris Rella, Feng Dong, Craig Haupt

Proceedings Volume 12053, 1205326 (2022) https://doi.org/10.1117/12.2614269

KEYWORDS: Reticles, Scanners, Optical filters, Contamination, Metrology, Lithography, Chemical analysis, Semiconducting wafers, Optical lithography, Statistical analysis

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SPIE Journal Paper | 16 October 2014

Scatterometry performance enhancement by holistic approach

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot

JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

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Proceedings Article | 2 April 2014 Paper

Scatterometry performance improvement by parameter and spectrum feed-forward

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour

Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639

KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Enhanced optical CD metrology by hybridization and azimuthal scatterometry

Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu

Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165

KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

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Proceedings Article | 5 April 2007 Paper

Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks

Kyung Lee, Sanjay Yedur, Sven Henrichs, Malahat Tavassoli, Kiho Baik

Proceedings Volume 6518, 651856 (2007) https://doi.org/10.1117/12.729246

KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Scatter measurement, Lithography, Binary data, Metrology

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Proceedings Article | 5 April 2007 Paper

Scatterometry on pelliclized masks: an option for wafer fabs

Emily Gallagher, Craig Benson, Masaru Higuchi, Yasuhiro Okumoto, Michael Kwon, Sanjay Yedur, Shifang Li, Sangbong Lee, Milad Tabet

Proceedings Volume 6518, 65181T (2007) https://doi.org/10.1117/12.714997

KEYWORDS: Pellicles, Photomasks, Scatterometry, Metrology, Critical dimension metrology, Semiconducting wafers, Quartz, Data modeling, Scatter measurement, Cadmium

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Proceedings Article | 20 October 2006 Paper

CD and profile metrology of EUV masks using scatterometry based optical digital profilometry

Sung-yong Cho, Sanjay Yedur, Michael Kwon, Milad Tabet

Proceedings Volume 6349, 63492I (2006) https://doi.org/10.1117/12.686478

KEYWORDS: Scatterometry, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Metrology, Photomasks, Etching, EUV optics, Scatter measurement, Inspection

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Proceedings Article | 20 October 2006 Paper

Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scatterometery

Kyung-man Lee, Sanjay Yedur, Malahat Tavassoli, Kiho Baik, Milad Tabet

Proceedings Volume 6349, 63490M (2006) https://doi.org/10.1117/12.686305

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Photomasks, Atomic force microscopy, Binary data, 3D modeling, Cadmium, Metrology, 3D acquisition, 3D metrology

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Scatterometers are widely used for line/space or 2D structure measurements in both wafer and mask industries. This technology is now gaining more acceptance and is being applied 3D structures such as contacts and pads. Contact CDs and trench depth in photomasks are critical monitoring parameters in mask industry and are discussed here. We are reporting contact CDs and profile results measured from targets from Binary, PSM, and Crless plates. The strategies of model creation such as using simple trapezoid versus more advanced shapes affect how well SWA and footings can be measured and reported from these structures. We are reporting CD and profile information obtained with Scatterometer, and then comparing CD SEM, AFM, and cross section SEM. Multiple different modeling configurations were used with different levels of complexity, and we report on optimum modeling strategy to obtain profile information from 3D structures. The relationship between the modeling strategy versus cross correlation between different parameters is discussed. CD linearity, uniformity, and other correlation parameters to the reference CD SEM tool are reported. Target CDs ranged from 60nm up to 600nm. CD uniformity reported from Scatterometry is 20~30% less than that from CD SEMs. This CD uniformity improvement is due to the fact that scatterometer beam samples dozens to hundreds of samples and 'averages' profile parameters, thus eliminating local effect such as line edge roughness. Contact depth are also measured and compared to AFM, in which the bias between the two tools are usually around 3nm or less. In terms of smallest target CD measurable, in this paper we report routine measurement of small contacts with middle CD down to 65nm (bottom CD close to 50nm) with both RP and SE mode. Application of scatterometry method to mask contacts and pads leads to accurate and fast measurement of 3D profiles, and opens up possibility of in-line monitoring of profile information due to the higher runrate compared to traditional metrology tools.

Proceedings Article | 21 June 2006 Paper

CD and profile metrology of embedded phase shift masks using scatterometry

Kyung man Lee, Sanjay Yedur, Dave Hetzer, Malahat Tavassoli, Kiho Baik

Proceedings Volume 6281, 62810Z (2006) https://doi.org/10.1117/12.692699

KEYWORDS: Scanning electron microscopy, Scatterometry, Critical dimension metrology, Photomasks, Etching, Metrology, Phase shifts, Scatter measurement, Phase shifting, Cadmium

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Proceedings Article | 3 May 2006 Paper

Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry

Kyung-man Lee, Sanjay Yedur, Wen-hao Cheng, Malahat Tavassoli, Kiho Baik

Proceedings Volume 6283, 628313 (2006) https://doi.org/10.1117/12.681864

KEYWORDS: Scatterometry, Scanning electron microscopy, Photomasks, Atomic force microscopy, Scatter measurement, Critical dimension metrology, Binary data, Cadmium, Quartz, Reflectivity

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Proceedings Article | 24 March 2006 Paper

CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry

Kyung Lee, Sanjay Yedur, Sven Henrichs, Malahat Tavassoli

Proceedings Volume 6152, 61521P (2006) https://doi.org/10.1117/12.655642

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Scatterometry, Semiconducting wafers, Scatter measurement, Cadmium, Photomasks, Quartz, Atomic force microscopy, Etching

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Proceedings Article | 9 November 2005 Paper

Scatterometry based CD and profile metrology of MoSi/quartz structures

Sanjay Yedur, Vi Vuong, Deepak Shivaprasad, T.P. Sarathy, Milad Tabet, Rahul Korlahalli, Jiangtao Hu

Proceedings Volume 5992, 59924I (2005) https://doi.org/10.1117/12.632304

KEYWORDS: Data modeling, Critical dimension metrology, Metrology, Reflectivity, Scatterometry, Photomasks, Optical properties, Oscillators, Reflectance spectroscopy, Statistical modeling

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Proceedings Article | 5 November 2005 Paper

CD metrology of binary and phase shift masks using scatterometry

Kyung Lee, Sanjay Yedur, Milad Tabet, Malahat Tavassoli

Proceedings Volume 5992, 59921I (2005) https://doi.org/10.1117/12.631971

KEYWORDS: Critical dimension metrology, Scatterometry, Scanning electron microscopy, Binary data, Quartz, Metrology, Glasses, Calibration, Atomic force microscopy, Phase shifts

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Proceedings Article | 2 June 2000 Paper

Phase profilometry for the 193-nm lithography gate stack

Nickhil Jakatdar, Xinhui Niu, Junwei Bao, Costas Spanos, Sanjay Yedur, Alain Deleporte

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386464

KEYWORDS: Fourier transforms, Metrology, Lithography, Diffraction gratings, Diffraction, Thin films, Spectroscopy, Reflectance spectroscopy, Curium, Reflectometry

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Proceedings Article | 2 June 2000 Paper

Specular spectroscopic profilometry for the sub-0.18-um polySi-gate processes

Xinhui Niu, Nickhil Jakatdar, Sanjay Yedur, Bhanwar Singh

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386449

KEYWORDS: Spectroscopy, Metrology, Diffraction, Lithography, Diffraction gratings, Etching, Thin films, Spectroscopes, Deep ultraviolet, Atomic force microscopy

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Proceedings Article | 2 June 2000 Paper

Experiments in mask metrology using a CD AFM

Martin Klos, Sanjay Yedur

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386491

KEYWORDS: Calibration, Critical dimension metrology, Photomasks, Atomic force microscopy, Metrology, Ions, Semiconducting wafers, Precision measurement, Silicon, Profiling

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Proceedings Article | 14 June 1999 Paper

Specular spectroscopic scatterometry in DUV lithography

Xinhui Niu, Nickhil Jakatdar, Junwei Bao, Costas Spanos, Sanjay Yedur

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350802

KEYWORDS: Scatterometry, Diffraction, Spectroscopes, Diffraction gratings, Spectroscopy, Metrology, Lithography, Atomic force microscopy, Critical dimension metrology, Photoresist materials

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Proceedings Article | 14 June 1999 Paper

Evaluation of atomic force microscopy: comparison with electrical CD metrology and low-voltage scanning electron microscopy

Sanjay Yedur, Bhanwar Singh

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350853

KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Metrology, Environmental sensing, Semiconducting wafers, Atomic force microscope, Resistors, Cadmium, Reliability

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Showing 5 of 18 publications

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