Dr. Sankha Subhra Sarkar
at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical proximity correction, Lithography, Metals, Source mask optimization, Diffraction, Image quality, Modulation transfer functions, SRAF, Resolution enhancement technologies, Spatial frequencies

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Source mask optimization, Photomasks, Lithography, Standards development, Algorithm development, Resolution enhancement technologies, Diffraction, Visualization, Photovoltaics

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