Wolter mirrors fabricated by high-precision Ni electroforming process have been applied as focusing optics for x-ray telescopes. The typical replication accuracy is on the order of 100nm. For higher resolution observations, the figure accuracy is required to be improved. Recently, we have been developing an efficient figure correction method using an Si layer on Wolter mirror. Film thickness of Si can be measured with accuracy of 1nm level by thickness measurement gauge. Si is removed under wet process so that the figure accuracy improves. In this study, we developed a fluid jet polishing system especially for removing Si layer on the inner surface of Wolter mirrors. Surface roughness remained unchanged at 0.3nm in RMS (root mean square) value before and after processing to a depth of 133nm. For demonstration, a sine curve with a length of 10mm and PV (peak to valley) of 160nm was processed on Si on a plane surface, resulting in a processing accuracy of 25nm in PV and 6.7nm in RMS.
Steeply curved free-form x-ray mirrors, represented by monolithic ellipsoidal or Wolter mirrors, are required for submicron focusing without chromatic aberrations in the soft x-ray region. Such mirrors require a different approach to surface machining and metrology than conventional mirrors with small sags, such as Kirkpatrick-Baez or plane mirrors. A few examples of the fabrication of Wolter mirrors have been reported, in which surface measurements using a surface profilometer with a contact probe were used for figure correction. However, owing to differences in measurement methods and fabrication difficulties, the fabrication performance has not been fully evaluated on a comparative basis. In this study, a high-precision plane mirror was fabricated using the same process as that used for steeply curved free-form mirrors. The figure measurement accuracy was comparatively evaluated, and the results suggested the possibility of achieving a figure accuracy of 5nm in PV and 0.7nm in RMS in steeply curved free-form mirror fabrication.
We have been developing a transmission soft x-ray microscope utilizing Wolter mirrors at a soft x-ray beamline of SACLA. We upgraded the soft x-ray microscope to enable simultaneous visible light imaging and soft x-ray imaging. To achieve this, we divided the annular apertures of the condenser and objective Wolter mirrors into two sections, allowing for soft x-ray imaging with one part and visible light imaging with the other. Our microscopy allows imaging cells with fluorescent labels by visible light while observing them with water window soft x-rays, which is useful for studying living cells.
Coherent or partially coherent X-rays have recently been utilized in beamlines at advanced synchrotron radiation facilities and X-ray free-electron lasers. Wave-optical and ray-tracing calculations are widely employed to predict intensity and phase distributions of X-ray beams when designing new beamlines. Both calculation methods have
their respective advantages and disadvantages. In this presentation, we will compare the results of calculations in optical systems that use X-ray focusing mirrors, and introduce a method for combining these two methods. Furthermore, we will discuss the applications of this method for calculating partially coherent X-rays.
KEYWORDS: X-rays, Mirrors, Signal detection, Optical properties, Signal intensity, Nonlinear optics, X-ray lasers, Signal generators, Free electron lasers
We have developed a two-stage soft X-ray focusing system at BL1 of SACLA. The system consists of two free-form mirrors, a ring focusing mirror and a quasi ellipsoidal mirror. Soft X-rays with photon energies around 120 eV can be focused down to φ350 nm. By using its unique intensity pattern after focusing, we propose a background-free signal detection method for extremely low optical signals such as SHG of soft X-ray.
This paper presents the designs and simulations of twin Wolter mirrors for focusing and imaging experiments with soft Xray free electron lasers. Wave-optical simulations at a photon energy of 100 eV indicate that the designed focusing Wolter mirror focuses soft X-ray beams to a 300 nm × 200 nm spot with an acceptable rotational error of 1.7 mrad × 1.4 mrad and that the objective Wolter mirror, which receives the beam that passes through the focusing Wolter mirror and a sample, forms bright-field images with a spatial resolution of 140 nm × 140 nm. The focusing Wolter mirror enables long-term experiments with high stability, and the objective Wolter mirror is applicable to imaging-before-destruction.
An X-ray ellipsoidal mirror requires nanometer-level shape accuracy for its internal surface. Owing to the difficulty in processing the surface, electroforming using a high precision master mandrel has been applied to mirror fabrication. In order to investigate the replication accuracy of electroforming, a measurement method for the entire internal surface of the mirror must be developed. The purpose of this study is to evaluate the shape replication accuracy of electroforming. In this study, a three-dimensional shape measurement apparatus for an X-ray ellipsoidal mirror is developed. The apparatus is composed of laser probes, a contact probe, reference flats, a z-axis stage, and a rotation table. First, longitudinal profiles of a mandrel or mirror placed vertically on the rotation table are measured at several angular positions. Subsequently, without realignment of the measured sample, circularity at every height is measured at regular intervals of 0.1 mm. During each measurement, the effect of motion errors is calculated and subtracted from each profile by referring to the distances between the probes and reference flats. Combining the circularity data with the longitudinal profiles, a three-dimensional error distribution of the entire surface is obtained. Using a mandrel with nanometer-level shape accuracy and a replicated mirror, the performance of the measurement apparatus and the replication accuracy are evaluated. Measurement repeatability of single-nanometer order and replication accuracy of sub-100-nm order are confirmed.
The Wolter mirror is a promising imaging device for soft x-ray microscopy owing to its excellent characteristics. Its annular aperture enables high-NA design while maintaining high photon transfer efficiency. However, its deep and narrow cylinder-like shape makes its fabrication difficult. Despite its long history, the Wolter mirror has not been practically used for high-resolution microscopy. We have been developing a fabrication process for grazing incidence mirrors with rotationally symmetric shapes. The mirrors are replicated from precisely machined mandrels. We employ electroforming as a replication method with high replication accuracy and reproductivity. Here, we report the first fabrication of a Wolter mirror and discuss the replication quality in electroforming. The imaging quality of Wolter mirror is also evaluated in an observation experiment using a visible-light microscope.
Mirrors are key devices for creating various systems in optics. Focusing X-ray and extreme ultraviolet (EUV) light requires mirror surfaces with an extremely high accuracy. The figure of an ellipsoidal mirror is obtained by rotating an elliptical profile, and using such a mirror, soft X-ray and EUV light can be focused to dimensions on the order of nanometers without chromatic aberration. Although the theoretical performance of ellipsoidal mirrors is extremely high, the fabrication of an ideal ellipsoidal mirror remains problematic. Based on this background, we have been working to develop a fabrication system for ellipsoidal mirrors. In this proceeding, we briefly introduce the fabrication process and the soft X-ray focusing performance of the ellipsoidal mirror fabricated using the proposed process.
The Wolter mirror has been a promising imaging device in X-ray microscopy owing to its excellent characteristics such
as no achromatic aberration, a large aperture and a long work distance. Despite its long history, a Wolter mirror has not
been practically used for high resolution microscopy because extremely high figure accuracy is required on the surface.
In this paper, we will show the result of optical simulations targeted at the design of a soft X-ray imaging system with
sub-10nm spatial resolution.
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