Mr. Satoru Yamaguchi Profile

Satoru Yamaguchi

at Hitachi High-Technologies Corp

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Author

Publications (8)

Proceedings Article | 29 March 2019 Presentation + Paper

What is prevalent CD-SEM's role in EUV era?

Zhigang Wang, Yoshinori Momonoi, Katsumi Setoguchi, Makoto Suzuki, Satoru Yamaguchi

Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII

KEYWORDS: Metrology, Extreme ultraviolet, Image processing, Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Process control, Lithography, Error analysis

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SPIE Journal Paper | 23 July 2018

Measurement of pattern roughness and local size variation using CD-SEM

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

JM3 Vol. 17 Issue 04

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

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Proceedings Article | 13 March 2018 Paper

Measurement of pattern roughness and local size variation using CD-SEM: current status

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Critical dimension metrology, Detection and tracking algorithms, Metrology, Reliability, Process control, Image filtering

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Proceedings Article | 4 April 2016 Paper

Advanced CD-SEM metrology for qualification of DSA patterns using coordinated line epitaxy (COOL) process

Takeshi Kato, Junko Konishi, Masami Ikota, Satoru Yamaguchi, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Tsukasa Azuma

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Directed self assembly, Epitaxy, Chemical analysis, Line width roughness, Annealing, Etching, Line edge roughness, Polymethylmethacrylate, Lithography, Edge roughness

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Proceedings Article | 2 April 2014 Paper

New robust edge detection methodology for qualifying DSA characteristics by using CD SEM

Satoru Yamaguchi, Kazuhiro Ueda, Takeshi Kato, Norio Hasegawa, Takashi Yamauchi, Shinichiro Kawakami, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Edge detection, Scanning electron microscopy, Thin films, Error analysis, Critical dimension metrology, Metrology, Edge roughness, Polymer thin films, Signal detection, Directed self assembly

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Proceedings Article | 10 April 2013 Paper

Fundamentals of overlay measurement and inspection using scanning electron-microscope

T. Kato, Y. Okagawa, O. Inoue, K. Arai, S. Yamaguchi

Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII

KEYWORDS: Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Scanners, Inspection, Optical testing, Wafer-level optics, Optical alignment, Control systems, Silicon

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Proceedings Article | 2 June 2000 Paper

New approach to the focus exposure matrix (FEM) sample measurement using CD-SEM

Hidetoshi Morokuma, Satoru Yamaguchi, Tatsuya Maeda, Takashi Iizumi, Kazuo Ueda

Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV

KEYWORDS: Finite element methods, Semiconducting wafers, Time metrology, Algorithm development, Detection and tracking algorithms, Semiconductors, Semiconductor manufacturing, Reliability, Scanning electron microscopy, Pattern recognition

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Proceedings Article | 1 July 1993 Paper

Optical waveguide interconnections for optoelectronic multichip modules

Hideyuki Takahara, Shinji Koike, Satoru Yamaguchi, Hisashi Tomimuro

Proc. SPIE. 1849, Optoelectronic Interconnects

KEYWORDS: Waveguides, Optoelectronics, Packaging, Mirrors, Photodiodes, Geometrical optics, Light wave propagation, Fiber couplers, Glasses, Reactive ion etching

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Showing 5 of 8 publications

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