Dr. Satoshi Enomoto
at Toyo Gosei Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Electron beam lithography, Light sources, Optical lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Semiconducting wafers, Stochastic processes, Absorption, Chemically amplified resists

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Proceedings Article | 24 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Light sources, Contamination, Ultraviolet radiation, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Chemically amplified resists

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Electron beams, Polymers, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Manganese, Neodymium, Surface conduction electron emitter displays, Absorption

Showing 5 of 7 publications
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