Dr. Satoshi Enomoto Profile

Dr. Satoshi Enomoto

at Toyo Gosei Co Ltd

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Author

Publications (7)

Proceedings Article | 26 September 2019 Paper

Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning

Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa

Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019

KEYWORDS: Electron beam lithography, Light sources, Optical lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

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Proceedings Article | 25 March 2019 Paper

Improvement of dual insolubilization resist performance through the incorporation of various functional units

Satoshi Enomoto, Takumi Yoshino, Kohei Machida, Takahiro Kozawa

Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI

KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Semiconducting wafers, Stochastic processes, Absorption, Chemically amplified resists

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Proceedings Article | 13 March 2018 Paper

Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking

Satoshi Enomoto, Takumi Yoshino, Kohei Machida, Takahiro Kozawa

Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV

KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

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Proceedings Article | 24 April 2014 Paper

High-resist sensitization by pattern and flood combination lithography

Seiichi Tagawa, Akihiro Oshima, Satoshi Enomoto, C. Q. Dinh

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Lithography, Light sources, Contamination, Ultraviolet radiation, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Chemically amplified resists

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Proceedings Article | 1 April 2013 Paper

Reaction mechanisms of various chemically amplified EUV and EB resist

Satoshi Enomoto, Akihiro Oshima, Seiichi Tagawa

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Lithography, Electron beams, Polymers, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Manganese, Neodymium, Surface conduction electron emitter displays, Absorption

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Proceedings Article | 1 April 2013 Paper

Prediction of resist sensitivity for 13.5-nm EUV and 6.x-nm EUV extension from sensitivity for EBL

Tomoko Oyama, Akihiro Oshima, Tuan Dang, Satoshi Enomoto, Masakazu Washio, Seiichi Tagawa

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Semiconductors, Electron beam lithography, Polymethylmethacrylate, X-rays, Silicon, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Synchrotron radiation

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Proceedings Article | 1 April 2013 Paper

Relation between sensitivity and resolution in polymer bound PAGs and polymer blend PAGs

Satoshi Enomoto, Tuan Nguyen Dang, Cong Que Dinh, Seiichi Tagawa

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Nanotechnology, Lithography, Optical lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

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Showing 5 of 7 publications

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