Dr. Saumya Sharma
Patterning Scientist at IBM Research
Area of Expertise:
Thin Films , Process development , Nano-device Fabrication
Publications (2)

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11326, 113260W (2020) https://doi.org/10.1117/12.2552112

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