Mr. Scott L. Light Profile

Scott L. Light

SMTS Lead Photo - Advanced DRAM at Micron Technology Inc

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Author

Publications (13)

Proceedings Article | 12 May 2020 Presentation + Paper

Extending EUV lithography for DRAM applications

Gijsbert Rispens, Claire Van Lare, Dorothe Oorschot, Rik Hoefnagels, Shih-Hsiang Liu, Willem Van Mierlo, Nadia Zuurbier, Zoi Dardani, Ziyang Wang, Mark John Maslow, Jo Finders, Roberto Fallica, Andreas Frommhold, Eric Hendrickx, Ardavan Niroomand, Scott Light

Proceedings Volume 11323, 113230U (2020) https://doi.org/10.1117/12.2552067

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Finite element methods, Optical lithography, Photomasks, Extreme ultraviolet, Stochastic processes, Inspection

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Proceedings Article | 25 March 2016 Paper

Fundamental characterization of shrink techniques on negative tone development based dense contact holes

Kaveri Jain, Scott Light

Proceedings Volume 9779, 97790Q (2016) https://doi.org/10.1117/12.2218626

KEYWORDS: Atomic layer deposition, Photoresist materials, Photoresist developing, Dry etching, Etching, Electronics, Materials processing, Optical lithography, Semiconducting wafers, Thin film coatings, Plasma etching, Photomicroscopy, Plasma, Image processing

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Proceedings Article | 27 March 2015 Paper

Impact of materials selection on graphoepitaxial directed self-assembly for line-space patterning

Dung Quach, Valeriy Ginzburg, Mingqi Li, Janet Wu, Shih-wei Chang, Peter Trefonas, Phillip Hustad, Dan Millward, Gurpreet Lugani, Scott Light

Proceedings Volume 9423, 94230N (2015) https://doi.org/10.1117/12.2085807

KEYWORDS: Optical lithography, Etching, Silicon, Reactive ion etching, Line width roughness, Polymers, Scanning electron microscopy, Cadmium, Directed self assembly, Glasses

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Proceedings Article | 19 March 2015 Paper

Graphoepitaxial and chemoepitaxial methods for creating line-space patterns at 33nm pitch: comparison to a HVM process

Dan Millward, Gurpreet Lugani, Scott Light, Ardavan Niroomand, Phillip Hustad, Peter Trefonas, Dung Quach, Valeriy Ginzburg

Proceedings Volume 9423, 942304 (2015) https://doi.org/10.1117/12.2086693

KEYWORDS: Etching, Semiconducting wafers, Line width roughness, Cadmium, Scanning electron microscopy, Dry etching, Silicon, Line edge roughness, Polymers, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly

Dan Millward, Gurpreet Lugani, Ranjan Khurana, Scott Light, Ardavan Niroomand, Philip Hustad, Peter Trefonas, Shih-wei Chang, Christopher Lee, Dung Quach

Proceedings Volume 9054, 90540M (2014) https://doi.org/10.1117/12.2045580

KEYWORDS: Etching, Scanning electron microscopy, Carbon, Semiconducting wafers, Dry etching, Inspection, Cadmium sulfide, Line width roughness, Optical lithography, Directed self assembly

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Proceedings Article | 12 April 2013 Paper

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang

Proceedings Volume 8683, 86830W (2013) https://doi.org/10.1117/12.2014402

KEYWORDS: Scanners, Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Optical lithography, Metrology, Cadmium, Optics manufacturing, Databases, Diffractive optical elements

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Proceedings Article | 20 April 2011 Paper

Wafer quality analysis of various scribe line mark designs

Jianming Zhou, Craig Hickman, Yuan He, Scott Light, Lucas Lamonds, Anton deVilliers

Proceedings Volume 7971, 79711H (2011) https://doi.org/10.1117/12.881551

KEYWORDS: Semiconducting wafers, Spatial light modulators, Optical alignment, Diffraction, Scanners, Reflection, Signal detection, Manufacturing, Thin films, Sensors

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Proceedings Article | 16 April 2011 Paper

Resist freezing process challenges of cross pattern applications

Zishu Zhang, Kaveri Jain, Scott Light, Anton deVilliers

Proceedings Volume 7972, 79720E (2011) https://doi.org/10.1117/12.881552

KEYWORDS: Double patterning technology, Etching, Plasma, Photoresist processing, Plasma treatment, Scanning electron microscopy, Chemical reactions, Image processing, Printing, Reflectivity

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Proceedings Article | 4 March 2010 Paper

Improving aberration control with application specific optimization using computational lithography

Jianming Zhou, Youping Zhang, Peter Engblom, Mike Hyatt, Eric Wu, Martin Snajdr, Anton deVilliers, Yuan He, Craig Hickman, Peng Liu, Dennis de Lang, Bernd Geh, Erik Byers, Scott Light

Proceedings Volume 7640, 76400K (2010) https://doi.org/10.1117/12.846697

KEYWORDS: Semiconducting wafers, Scanners, Computational lithography, Optimization (mathematics), Calibration, Finite element methods, Thermal modeling, Computer simulations, Data modeling, Critical dimension metrology

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 26 March 2007 Paper

Effects of reticle birefringence on 193-nm lithography

Scott Light, Irina Tsyba, Christopher Petz, Pary Baluswamy, Brett Rolfson

Proceedings Volume 6520, 65201K (2007) https://doi.org/10.1117/12.712251

KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Line edge roughness, Polarization, Birefringence, Photomasks, Optical lithography, Cadmium, 193nm lithography

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Proceedings Article | 12 May 2005 Paper

A methodology for the characterization of topography induced immersion bubble defects

Michael Kocsis, Peter De Bisschop, Mireille Maenhoudt, Young-Chang Kim, Greg Wells, Scott Light, Tony DiBiase

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599329

KEYWORDS: Semiconducting wafers, Reticles, Scanners, Inspection, Defect inspection, Prototyping, Etching, Metrology, Scanning electron microscopy, Immersion lithography

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Proceedings Article | 28 May 2004 Paper

157-nm photoresist process optimization for a full-field scanner

Scott Light, Nickolay Stepanenko, Roel Gronheid, Frieda Van Roey, Dieter Van den Heuvel, Anne-Marie Goethals

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537212

KEYWORDS: Scanners, Etching, Binary data, Reticles, Line edge roughness, Scanning electron microscopy, Semiconducting wafers, Resistance, Photoresist materials, Photomasks

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Showing 5 of 13 publications

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