Dr. Sebastian U. Engelmann
Research Staff Member and Manager at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (18)

Proceedings Article | 1 March 2021 Presentation + Paper
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Semiconductors, Thin films, Switching, Etching, Chemistry, Profiling, Plasma etching, Applied physics, Halogens, Plasma

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Analytics, Metrology, Statistical analysis, Sensors, Manufacturing, Time metrology, Data processing, Process control, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Carbon, Etching, Argon, Silicon, Plasmas, Oxygen, Plasma etching, Reactive ion etching, Fluorine, Halogens

SPIE Journal Paper | 8 January 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Optical lithography, Extreme ultraviolet, High volume manufacturing, Extreme ultraviolet lithography, Lithography, Photomasks, Roads, Photoresist technology, Plasma etching, Image processing

Proceedings Article | 16 May 2018 Presentation + Paper
Proc. SPIE. 10629, Chemical, Biological, Radiological, Nuclear, and Explosives (CBRNE) Sensing XIX
KEYWORDS: Photodetectors, Methane, Optical sensors, Sensors, Calibration, Spectroscopy, Absorbance, Absorption spectroscopy, Absorption

Showing 5 of 18 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 9 May 2018

SPIE Conference Volume | 4 May 2017

SPIE Conference Volume | 25 July 2016

SPIE Conference Volume | 23 April 2015

Conference Committee Involvement (11)
Advanced Etch Technology and Process Integration for Nanopatterning XI
27 February 2022 | San Jose, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Showing 5 of 11 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top