Mr. Seiji Matsuura Profile

Seiji Matsuura

at DNP Fine Electronics Sagamihara Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 12 May 2005 Paper

Current status of 157-nm lithography using a full-field scanner

Toshiyuki Ishimaru, Seiji Matsuura, Miyoshi Seki, Kiyoshi Fujii, Ryo Koizumi, Yuji Hakataya, Akihiko Moriya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599300

KEYWORDS: Scanners, Etching, Lithography, Line width roughness, Optical alignment, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Lithographic illumination, Light sources

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Proceedings Article | 12 May 2005 Paper

Status of 157 nm lithography and prospects for immersion

Kiyoshi Fujii, Takuya Hagiwara, Seiji Matsuura, Toshiyuki Ishimaru, Yoshihisa Matsubara, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599455

KEYWORDS: Lithography, Immersion lithography, Refractive index, Absorption, Scanners, Lithographic illumination, Polarization, Optical lithography, Photomasks, Scanning electron microscopy

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Proceedings Article | 12 May 2005 Paper

Fabrication of sub 45 nm random patterns through centerline phase-shifting mask (CL-PSM)

Jeung-woo Lee, Seiji Matsuura, Kiyoshi Fujii

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599309

KEYWORDS: Phase shifts, Photomasks, Nanoimprint lithography, Chromium, Lithography, Resolution enhancement technologies, Binary data, Optical lithography, Logic, Fluorine

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Proceedings Article | 28 May 2004 Paper

157-nm chromeless phase lithography with extremely high numerical aperture

Kunio Watanabe, Takuya Hagiwara, Seiji Matsuura, Toshifumi Suganaga , Toshiro Itani , Kiyoshi Fujii

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535150

KEYWORDS: Lithography, Photomasks, Nanoimprint lithography, Lithographic illumination, Chromium, Quartz, Semiconducting wafers, Resolution enhancement technologies, Image resolution, Optical lithography

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Proceedings Article | 28 May 2004 Paper

In-situ aberration monitoring using phase wheel targets

Lena Zavyalova, Bruce Smith, Toshifumi Suganaga, Seiji Matsuura, Toshiro Itani, Julian Cashmore

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537379

KEYWORDS: Monochromatic aberrations, Wavefronts, Lithography, Imaging systems, Point spread functions, Spherical lenses, Optical transfer functions, Zernike polynomials, Fourier transforms, Target detection

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Proceedings Article | 28 May 2004 Paper

157-nm chromeless phase lithography for 45-nm SRAM gate

Toshifumi Suganaga, Kunio Watanabe, Seiji Matsuura, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534897

KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Line edge roughness, Lithographic illumination, Resolution enhancement technologies, Photoresist processing, Transmittance, Semiconductors, Fabrication

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Proceedings Article | 30 July 2002 Paper

Modified Rayleigh equation: impact of image fluctuation on imaging performance

Seiji Matsuura, Takeo Hashimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474527

KEYWORDS: Diffusion, Critical dimension metrology, Image resolution, Lithography, Image processing, Photomasks, Image enhancement, Optical lithography, Optical resolution, Scanners

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Proceedings Article | 14 September 2001 Paper

Reduction of mask error enhancement factor (MEEF) by the optimum exposure dose self-adjusted mask

Seiji Matsuura, Takayuki Uchiyama, Takeo Hashimoto

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435783

KEYWORDS: Photomasks, Critical dimension metrology, Binary data, Opacity, Semiconducting wafers, Phase shifts, Resolution enhancement technologies, Mask making, Optical lithography, Image processing

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Proceedings Article | 5 July 2000 Paper

Influence of resist process on the best focus shift due to lens spherical aberration

Seiji Matsuura, Takayuki Uchiyama, Hiroyoshi Tanabe

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388968

KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Lithography, Neodymium, Photoresist processing, Photomasks, Diffusion, Wavefront aberrations, Phase shifts, Phase measurement

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Proceedings Article | 29 June 1998 Paper

Effect of stage synchronization error of KrF scan on 0.18-um patterning

Takayuki Uchiyama, Takeo Hashimoto, Masashi Fujimoto, Seiji Matsuura, Tamio Yamazaki, Kunihiko Kasama

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310802

KEYWORDS: Critical dimension metrology, Optical lithography, Tolerancing, Reticles, Scanners, Excimer lasers, Distortion, Chemical analysis, Image resolution, Error analysis

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