Mr. Seiji Matsuura Profile

Seiji Matsuura

at DNP Fine Electronics Sagamihara Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 12 May 2005 Paper

Current status of 157-nm lithography using a full-field scanner

Toshiyuki Ishimaru, Seiji Matsuura, Miyoshi Seki, Kiyoshi Fujii, Ryo Koizumi, Yuji Hakataya, Akihiko Moriya

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Light sources, Lithographic illumination, Etching, Scanners, Scanning electron microscopy, Line width roughness, Optical alignment, Photoresist processing, Semiconducting wafers

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Fabrication of sub 45 nm random patterns through centerline phase-shifting mask (CL-PSM)

Jeung-woo Lee, Seiji Matsuura, Kiyoshi Fujii

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Nanoimprint lithography, Fluorine, Binary data, Resolution enhancement technologies, Phase shifts

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Status of 157 nm lithography and prospects for immersion

Kiyoshi Fujii, Takuya Hagiwara, Seiji Matsuura, Toshiyuki Ishimaru, Yoshihisa Matsubara, Wataru Wakamiya

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Lithography, Refractive index, Optical lithography, Lithographic illumination, Polarization, Scanners, Scanning electron microscopy, Photomasks, Immersion lithography, Absorption

Read Abstract +

Proceedings Article | 28 May 2004 Paper

In-situ aberration monitoring using phase wheel targets

Lena Zavyalova, Bruce Smith, Toshifumi Suganaga, Seiji Matsuura, Toshiro Itani, Julian Cashmore

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Target detection, Lithography, Monochromatic aberrations, Optical transfer functions, Point spread functions, Imaging systems, Fourier transforms, Wavefronts, Zernike polynomials, Spherical lenses

Read Abstract +

Proceedings Article | 28 May 2004 Paper

157-nm chromeless phase lithography for 45-nm SRAM gate

Toshifumi Suganaga, Kunio Watanabe, Seiji Matsuura, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Fabrication, Semiconductors, Lithography, Lithographic illumination, Transmittance, Photomasks, Nanoimprint lithography, Line edge roughness, Photoresist processing, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 28 May 2004 Paper

157-nm chromeless phase lithography with extremely high numerical aperture

Kunio Watanabe, Takuya Hagiwara, Seiji Matsuura, Toshifumi Suganaga , Toshiro Itani , Kiyoshi Fujii

Proc. SPIE. 5377, Optical Microlithography XVII

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Quartz, Image resolution, Chromium, Photomasks, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Modified Rayleigh equation: impact of image fluctuation on imaging performance

Seiji Matsuura, Takeo Hashimoto

Proc. SPIE. 4691, Optical Microlithography XV

KEYWORDS: Lithography, Optical lithography, Image processing, Scanners, Diffusion, Image resolution, Optical resolution, Photomasks, Image enhancement, Critical dimension metrology

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Reduction of mask error enhancement factor (MEEF) by the optimum exposure dose self-adjusted mask

Seiji Matsuura, Takayuki Uchiyama, Takeo Hashimoto

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Optical lithography, Opacity, Image processing, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers, Binary data, Resolution enhancement technologies, Phase shifts

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Influence of resist process on the best focus shift due to lens spherical aberration

Seiji Matsuura, Takayuki Uchiyama, Hiroyoshi Tanabe

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Lithography, Monochromatic aberrations, Diffusion, Wavefront aberrations, Photomasks, Phase measurement, Critical dimension metrology, Neodymium, Photoresist processing, Phase shifts

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Effect of stage synchronization error of KrF scan on 0.18-um patterning

Takayuki Uchiyama, Takeo Hashimoto, Masashi Fujimoto, Seiji Matsuura, Tamio Yamazaki, Kunihiko Kasama

Proc. SPIE. 3334, Optical Microlithography XI

KEYWORDS: Reticles, Optical lithography, Scanners, Error analysis, Image resolution, Distortion, Excimer lasers, Chemical analysis, Critical dimension metrology, Tolerancing

Read Abstract +