Senajith B. Rekawa
Engineering Manager at Lawrence Berkeley National Lab
SPIE Involvement:
Publications (32)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Image processing, Scanners, Scanning electron microscopy, Projection systems, Vibration isolation, Semiconducting wafers, Camera shutters

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Monochromatic aberrations, Optical lithography, Image processing, Scanning electron microscopy, Photoresist materials, Projection systems, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Monochromatic aberrations, Optical design, Sensors, Interferometry, Wavefronts, Multiplexing, Optical alignment, Diffraction gratings, Shearing interferometers

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Microscopes, Mirrors, Lithographic illumination, Coherence (optics), Lenses, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 20 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Reticles, Lithographic illumination, Coherence (optics), Photomasks, Extreme ultraviolet, Optical proximity correction

Showing 5 of 32 publications
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