Mr. Seok-Hwan Oh Profile

Seok-Hwan Oh

Senior Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (15)

Proceedings Article | 20 April 2011 Paper

Reduction of SEM noise and extended application to prediction of CD uniformity and its experimental validation

Hoyeon Kim, Chan Hwang, Seok-hwan Oh, Jeongho Yeo, Young hee Kim

Proceedings Volume 7971, 79710K (2011) https://doi.org/10.1117/12.879590

KEYWORDS: Line width roughness, Scanning electron microscopy, Critical dimension metrology, Inspection, Photoresist materials, Image processing, Denoising, Semiconducting wafers, Data modeling, Metrology

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Proceedings Article | 11 December 2009 Paper

EUV sensitive photo-acid generator sans chromophore

K. Subramanya Mayya, Yool Kang, Takahiro Yasue, Seok-Hwan Oh, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7520, 75200R (2009) https://doi.org/10.1117/12.837341

KEYWORDS: Extreme ultraviolet lithography, Chromophores, Extreme ultraviolet, Lithography, Optical lithography, Optical transfer functions, Scanning electron microscopy, Electrons, Switches, Polymers

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Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

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Proceedings Article | 4 December 2008 Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

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Proceedings Article | 30 October 2007 Paper

Selective process aware OPC for memory device

Woosuk Shim, Sungsoo Suh, Frank Amoroso, Robert Lugg, Sooryung Lee, Sukjoo Lee, Seok-Hwan Oh, Junghyeon Lee, Tae-Hyuk Ahn, Chang-Jin Kang

Proceedings Volume 6730, 67302P (2007) https://doi.org/10.1117/12.747661

KEYWORDS: Optical proximity correction, SRAF, Photomasks, Data modeling, Semiconducting wafers, Lithography, Calibration, Process modeling, Printing, Inspection

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Proceedings Article | 12 May 2005 Paper

Era of double exposure in 70 nm node DRAM cell

Sang-Jin Kim, Joon-Soo Park, Tae-Young Kim, Byeong-Soo Kim, Gi-Sung Yeo, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599458

KEYWORDS: Photomasks, Double patterning technology, Lithography, Lithographic illumination, Optical lithography, Critical dimension metrology, Distortion, Phase shifts, Monte Carlo methods, Personal protective equipment

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Proceedings Article | 12 May 2005 Paper

The application criterion of model-based optical proximity correction in a low k1 process

Doo-Youl Lee, In-Sung Kim, Sung-Gon Jung, Myoung-Ho Jung, Joo-On Park, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599013

KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Lithography, Scanning electron microscopy, Photography, Process modeling, Photomasks, Scanners, Semiconducting wafers

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Proceedings Article | 24 May 2004 Paper

Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Jin-ah Kim, Seong-Jin Kim, Soo-Bok Chin, Seok-Hwan Oh, Doo-Hoon Goo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon, Christopher Raymond, Michael Littau, Byungjoo Youn, Chang-Jin Sohn

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536312

KEYWORDS: Scatterometry, Critical dimension metrology, Scanning electron microscopy, Scatter measurement, Metrology, Semiconducting wafers, Light scattering, Process control, Light sources, Time metrology

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Proceedings Article | 14 May 2004 Paper

Comprehensive analysis of sources of total CD variation in ArF resist perspective

Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry

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Proceedings Article | 30 July 2002 Paper

Is it possible to improve MEEF?

Seok-Hwan Oh, Hyoungkook Kim, Dae-Joung Kim, Young-Seok Kim, Chun-Suk Suh, Yong-Sun Koh, Chang-Lyong Song

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474522

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Optical lithography, Photoresist materials, Silver, Semiconductors, Electronics, Polonium, Printing

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Proceedings Article | 24 August 2001 Paper

Effect of development process time on the surface of photoresist with various chemical compositions investigated by atomic force microscopy

Chang Ko, Seok-Hwan Oh, Jae-Hwan Kim, Chang-Lyong Song, Sang-In Lee

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436875

KEYWORDS: Surface roughness, Critical dimension metrology, Atomic force microscopy, Optical lithography, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Coating, Lithography, Polymers

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Proceedings Article | 22 August 2001 Paper

Wafer-induced reading error in metal sputtering process

Dae-Joung Kim, Seok-Hwan Oh, Gisung Yeo, Yong-Guk Bae, Jaehwan Kim, Young-Hee Kim

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436793

KEYWORDS: Metals, Overlay metrology, Semiconducting wafers, Sputter deposition, Optical lithography, Dry etching, Thin films, Wafer-level optics, Error analysis, Electronics

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Proceedings Article | 7 July 1997 Paper

Pattern deformation induced from intensity-unbalanced off-axis illumination

Jin-Ha Kim, Seok-Hwan Oh, Dong-Seon Lee, Jeong-Ho Yeo, Yong Yu, Jeong-Lim Nam

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275980

KEYWORDS: Image quality, Diffraction, Semiconducting wafers

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Proceedings Article | 21 May 1996 Paper

Improved overlay measurement of CMP processed layers

Jeong-Ho Yeo, Jeong-Lim Nam, Seok-Hwan Oh, Joo-Tae Moon, Young-Bum Koh, Nigel Smith, Andrew Smout

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240095

KEYWORDS: Overlay metrology, Image enhancement, Etching, Data modeling, Semiconducting wafers, Chemical mechanical planarization, Image quality, Image contrast enhancement, Error analysis, Imaging systems

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Proceedings Article | 21 May 1996 Paper

Improved overlay reading on MLR structures

Jeong-Ho Yeo, Jeong-Lim Nam, Seok-Hwan Oh, Joo-Tae Moon, Young-Bum Koh, Nigel Smith, Andrew Smout

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240096

KEYWORDS: Light sources, Semiconducting wafers, Overlay metrology, Optical filters, Optical alignment, Wafer-level optics, Coating, Lamps, Xenon, Image filtering

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Showing 5 of 15 publications

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