Seok-Hwan Oh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Line width roughness, Scanning electron microscopy, Critical dimension metrology, Inspection, Photoresist materials, Image processing, Denoising, Semiconducting wafers, Data modeling, Metrology

Proceedings Article | 11 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Extreme ultraviolet lithography, Chromophores, Extreme ultraviolet, Lithography, Optical lithography, Optical transfer functions, Scanning electron microscopy, Electrons, Switches, Polymers

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical proximity correction, SRAF, Photomasks, Data modeling, Semiconducting wafers, Lithography, Calibration, Process modeling, Printing, Inspection

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top